In semiconductor device fabrication, the feature profiles of a high-aspect-ratio (HAR) Si
trench is needed to be controlled considering aspect-ratio-dependent etching (ARDE). This …

Edge illumination is an emerging X-ray phase contrast imaging technique providing
attenuation, phase and dark field contrast. Despite the successful transition from synchrotron …

Objective. High energy and large field of view (FOV) phase contrast imaging is crucial for
biological and even medical applications. Although some works have devoted to achieving …

Micro-optical gyroscopes (MOGs) place a range of components of the fiber-optic gyroscope
(FOG) onto a silicon substrate, enabling miniaturization, low cost, and batch processing …

A large amount of valuable research on black silicon (b-Si) nanostructures has pushed its
use further into application in recent years. However, the research results to be found are all …

We describe the rationale for selecting graphite as a substrate material suitable for
manufacturing curved high-aspect ratio metallic x-ray gratings and experimentally validate …

In this work, we propose our newly developed wafer-type plasma monitoring sensor based
on a floating-type double probe method that can be useful for two-dimensional (2D) in situ …

Recently, nanoimprinting has attracted a new round of attention in the industry due to the
boom in demand for augmented reality/virtual reality (AR/VR), metalens and microlens, and …

In this paper, we propose a new structure for Fin-iTFET where the main gate and source
metal are formed simultaneously, and the control gate and drain are formed simultaneously …

Edge illumination X-ray phase contrast imaging is a method which relies on two gratings to
obtain attenuation, phase and dark field contrast. Current gratings consist of periodic …