Measuring thermal properties of materials is not only of fundamental importance in
understanding the transport processes of energy carriers (electrons and phonons in solids) …

Atomic layer deposition (ALD) for high‐quality conformal inorganic thin films is one of the
cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less …

Two-dimensional (2D) materials have received extensive interest due to their exceptional
properties. It is strongly required to assemble 2D materials in bulk quantities for macroscopic …

Improving interfacial polarization and enhancing conductive losses have become two
important ways to achieve high electromagnetic wave absorption performance in dielectric …

Advanced deposition routes are vital for the growth of functional metal–organic thin films.
The gas-phase atomic/molecular layer deposition (ALD/MLD) technique provides solvent …

The atomic/molecular layer deposition (ALD/MLD) technique combining both inorganic and
organic precursors is strongly emerging as a unique tool to design exciting new functional …

Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics,
but it is also recognized as a promising fabrication strategy for various alkali-metal-based …

Pliable and lightweight thin-film magnets performing at room temperature are indispensable
ingredients of the next-generation flexible electronics. However, conventional inorganic …

Atomic layer deposition (ALD) technology is one of the cornerstones of the modern
microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic …

Atomic layer deposition (ALD) is known as a key enabler of the continuous advances in
device engineering for microelectronics. For instance, the state-of-the-art transistor …