Noise and Defects in Microelectronic Materials and Devices

DM Fleetwood - IEEE Transactions on Nuclear Science, 2015 - ieeexplore.ieee.org
This paper reviews and compares predictions of the Dutta-Horn model of low-frequency
excess (1/f) noise with experimental results for thin metal films, MOS transistors, and …

Total-Ionizing-Dose Effects, Border Traps, and 1/f Noise in Emerging MOS Technologies

DM Fleetwood - IEEE Transactions on Nuclear Science, 2020 - ieeexplore.ieee.org
Subthreshold leakage currents and threshold-voltage shifts due to total-ionizing-dose (TID)
irradiation are reviewed briefly for highly scaled devices in emerging MOS technologies …

Interface traps, correlated mobility fluctuations, and low-frequency noise in metal–oxide–semiconductor transistors

DM Fleetwood - Applied Physics Letters, 2023 - pubs.aip.org
Interface traps generally are not considered to be likely sources of low-frequency (LF) noise
and/or random telegraph noise (RTN) in metal–oxide–semiconductor (MOS) devices …

Total-Ionizing-Dose Effects and Low-Frequency Noise in 30-nm Gate-Length Bulk and SOI FinFETs With SiO2/HfO2 Gate Dielectrics

M Gorchichko, Y Cao, EX Zhang, D Yan… - … on Nuclear Science, 2019 - ieeexplore.ieee.org
Total-ionizing-dose (TID) effects and low-frequency noise are evaluated in 30-nm gate-
length bulk and silicon-on-insulator (SOI) FinFETs for devices with fin widths of 10-40 nm …

Investigation of total ionizing dose effects in 4H–SiC power MOSFET under gamma ray radiation

Y Sun, X Wan, Z Liu, H **, J Yan, X Li, Y Shi - Radiation Physics and …, 2022 - Elsevier
In this work, the gamma ray radiation-induced total ionizing dose (TID) effects in SiC power
MOSFETs are investigated. The transistor characteristics, such as transfer curve, output …

Random telegraph noise in nanometer-scale CMOS transistors exposed to ionizing radiation

S Bonaldo, DM Fleetwood - Applied Physics Letters, 2023 - pubs.aip.org
Nanometer-scale transistors often exhibit random telegraph noise (RTN) with high device-to-
device variability. Recent experiments up to Grad total ionizing dose (TID) demonstrate …

Total-Ionizing-Dose Effects and Low-Frequency Noise in 16-nm InGaAs FinFETs With HfO2/Al2O3 Dielectrics

S Bonaldo, SE Zhao, A O'Hara… - … on Nuclear Science, 2019 - ieeexplore.ieee.org
Total-ionizing-dose mechanisms are investigated in 16-nm InGaAs FinFETs with an HfO 2/Al
2 O 3 gate-stack. Transistors are irradiated up to 500 krad (SiO 2) and annealed at high …

Defects and Low-Frequency Noise in Irradiated Black Phosphorus MOSFETs With HfO2 Gate Dielectrics

CD Liang, R Ma, Y Su, A O'Hara… - … on Nuclear Science, 2018 - ieeexplore.ieee.org
We have evaluated radiation-induced charge trap** and low-frequency noise in
passivated black phosphorus (BP) MOSFETs with HfO 2 gate dielectrics. Thinning the gate …

Review of methodologies for evaluating short-circuit robustness and reliability of SiC power MOSFETs

R Cui, Z **n, Q Liu, J Kang, H Luo… - IEEE Journal of …, 2021 - ieeexplore.ieee.org
To accelerate the broad application of silicon carbide (SiC) power MOSFETs, their short-
circuit (SC) robustness and reliability must be thoroughly evaluated. This article, therefore …

Gate bias and length dependences of total ionizing dose effects in InGaAs FinFETs on bulk Si

SE Zhao, S Bonaldo, P Wang, R Jiang… - … on Nuclear Science, 2019 - ieeexplore.ieee.org
We evaluate the total ionizing dose (TID) responses of InGaAs nMOS FinFETs with different
gate lengths irradiated with 10-keV X-rays under different gate biases. The largest …