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Molecular dynamics simulations in semiconductor material processing: A comprehensive review
Y Yun, S Wu, D Wang, X Luo, J Chen, G Wang… - Measurement, 2024 - Elsevier
Molecular dynamics (MD) simulations have become a pivotal tool in the nanofabrication of
semiconductor materials, a key area of contemporary semiconductor process research. This …
semiconductor materials, a key area of contemporary semiconductor process research. This …
Surface quality and material removal rate in nanoscale micro-laser aided polishing on AlN monocrystal via thermal effect
Monocrystalline AlN is a hard-brittle material. Thus, much focus has been on finding ways to
treat it efficiently while minimizing damage. This work uses the molecular dynamics …
treat it efficiently while minimizing damage. This work uses the molecular dynamics …
Polishing-induced material attrition in surface-texturing AlN using a nanoscale polishing tool: An atomic-scale understanding
This study examines the alterations in the material properties and the effectiveness of the
nano-polishing process applied to the surface of AlN substrate material through molecular …
nano-polishing process applied to the surface of AlN substrate material through molecular …
Rolling mechanism profundities on material removal mechanism of surface-textured GaN using Molecular dynamics simulation
Molecular dynamics simulation examines how the polishing tool's rotating velocity and axes
affect surface nanotribological properties and material removal mechanism of patterned …
affect surface nanotribological properties and material removal mechanism of patterned …
Quantitative analysis of the polishing performance of Wurtzite-SiC surface texture on surface quality and material removal rate
Molecular dynamics simulation is used to study Wurtzite-SiC's structural changes after
polishing process. For realistic planarization conditions, various surface-textured structures …
polishing process. For realistic planarization conditions, various surface-textured structures …
Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive
B Wu, Y Sun, H Tan, S Wu - Materials Today Communications, 2024 - Elsevier
To achieve low-damage polishing on silicon carbide substrates utilizing a rotating diamond
abrasive, the molecular dynamics model for nano-polishing is established. The nano …
abrasive, the molecular dynamics model for nano-polishing is established. The nano …
Spring stiffness and heterointerface effects on GaN/AlN double-layer composites polishing
The actual polishing depth is one of the most crucial polishing factors, consistently less than
its designed value. Through three-dimensional Molecular Dynamics (MD) simulations, this …
its designed value. Through three-dimensional Molecular Dynamics (MD) simulations, this …