An electrodeposited crystalline functional chromium deposit which is nanogranular as
deposited, and the deposit may be both TEM and XRD crystalline or may be TEM crystalline …

An electroless copper plating solution is disclosed herein. The solution includes an aqueous
copper salt component, an aqueous cobalt salt component, a triamine based complexing …

A crystalline chromium deposit having a lattice parameter of 2.8895+/− 0.0025 Å, and an
article including the crystalline chromium deposit. An article including a crystalline chromium …

An electroless copper plating solution is disclosed herein. The solution includes an aqueous
copper salt component, an aqueous cobalt Salt component, a polyamine-based com plexing …

Catalytic anodes are an enabling technology for high speed, horizontal acid copper
electroplating. However, their usage is associated with high additive oxidation rates which …

(57) ABSTRACT A plating apparatus can keep concentrations of components of a plating
solution constant over a long period of time and can stably form a plated film having a more …

This application claims the benefit of priority under 35 USC S 119 (e) to US Provisional
Application No. 61/277, 503, filed Sep. 25, 2009, the entire contents of which appli cation are …

BACKGROUND 0002 The present invention relates to an electroless gold plating solution
comprising certain mercaptosuccinic com pounds and reduction accelerators for enhancing …

Provided herein are methods and apparatus for electroplating metal into recessed features.
The techniques described herein utilize a polarization stabilizer compound to increase the …

The invention consists of a chromium electroplating solution comprising a chromium
electroplating solution comprising:(1) a water soluble trivalent chromium salt;(2) at least one …