The focused ion beam (FIB) is a powerful tool for fabrication, modification, and
characterization of materials down to the nanoscale. Starting with the gallium FIB, which was …

When collimated beams of low energy ions are used to bombard materials, the surface often
develops a periodic pattern or “ripple” structure. Different types of patterns are observed to …

Surface etching by ion sputtering can be used to pattern surfaces. Recent studies using the
high-spatial-resolution capability of the scanning tunnelling microscope revealed in fact that …

While occasionally being able to charge and discharge more quickly than batteries, carbon‐
based electrochemical supercapacitors (SCs) are nevertheless limited by their simplicity of …

The formation of a self-organized nanoscale ripple pattern after off-normally incident ion
bombardment on the surface of amorphous materials, or on semiconductors like silicon that …

Low-energy ion-beam sputtering, ie the removal of atoms from a surface due to the impact of
energetic ions or atoms, is an inherent part of numerous surface processing techniques …

The intrinsic dynamic interactions at the plasma-material interface and critical role of
irradiation-driven mechanisms at the atomic scale during exposure to energetic particles …

This article considers the fundamentals of what happens in a solid when it is impacted by a
medium-energy gallium ion. The study of the ion/sample interaction at the nanometer scale …

The effects of H 2 O vapor introduced during focused ion beam (FIB) milling of diamond
(100) are examined. In particular, we determine the yield, surface morphology, and …

The formation of periodic ripple structures on surfaces bombarded with ions at oblique (off-
normal) incidence is a well-known and intensely studied phenomenon. In contrast to these …