TiN thin films have been grown by reactive magnetron sputtering. It has been shown that an
Ohmic contact to TiN thin-film can be made from indium. The TiN thin films have been shown …

This study reports the optical, electrical and mechanical properties of TiN films prepared by
direct rapid thermal nitridation process from a photo-patternable TiO 2 sol-gel layer. The sol …

In this study, we present the effect of the plasma deposition parameters on the electrical and
structural properties of Ti/TiN multilayers. The films were formed by rf magnetron sputtering …

Using RF reactive magnetron sputtering process in a 100% nitrogen atmosphere, TiNx thin
films were deposited on a quartz substrate. The crystal structure and optical properties of the …

Abstract Nano-crystalline Titanium Nitride (TiN) thin films were deposited on glass
substrates by reactive DC magnetron sputtering in the presence of a supported discharge …

Abstract TiO 2 monolayer and TiN/TiO 2 bilayer coatings were deposited on soda-lime glass
prepared by mixing two techniques, TiO 2 was deposited by sol-gel dip-coating and TiN film …

The remarkable ability of natural proteins to conduct electricity in the dry state over long
distances remains largely inexplicable despite intensive research. In some cases, a (weakly) …

Photosensitive heterojunctions n-TiN/p-CdTe were fabricated for the first time by means of
titanium nitride thin film deposition (n-type conductivity) by the reactive magnetron sputtering …

The structure, mechanical, optical, and electrical properties of Ti 1− x Nb x N thin films, 0≤
x≤ 1, are reported. The films were deposited onto polycrystalline nuclear grade 316LN …

Titanium nitride (TiN) thin films thickness of∼ 260 nm prepared by dc reactive sputtering
were irradiated with 200 keV silver (Ag) ions to the fluences ranging from 5× 10 15 ions/cm 2 …