Electromagnetic (EM) absorbers play an increasingly essential role in the electronic
information age, even toward the coming “intelligent era”. The remarkable merits of …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

The use of solid electrolytes is a promising direction to improve the energy density of lithium‐
ion batteries. However, the low ionic conductivity of many solid electrolytes currently hinders …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

The scaling of complementary metal oxide semiconductor (CMOS) transistors has led to the
silicon dioxide layer used as a gate dielectric becoming so thin (1.4 nm) that its leakage …

Over the last few decades there has been a huge interest in nanostructured functional
materials and assembly techniques for preparing functional molecular assemblies with …

Al2O3 films were deposited by atomic layer deposition (ALD) at temperatures as low as 33°
C in a viscous-flow reactor using alternating exposures of Al (CH3) 3 (trimethylaluminum …

The scaling of complementary metal oxide semiconductor (CMOS) transistors has led to the
silicon dioxide layer used as a gate dielectric becoming so thin that the gate leakage current …

The principles of the atomic layer deposition (ALD) method are presented emphasizing the
importance of precursor and surface chemistry. With a proper adjustment of the experimental …

This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …