Recent advances in GaN‐based power HEMT devices

J He, WC Cheng, Q Wang, K Cheng… - Advanced electronic …, 2021 - Wiley Online Library
The ever‐increasing power density and operation frequency in electrical power conversion
systems require the development of power devices that can outperform conventional Si …

State of the art on gate insulation and surface passivation for GaN-based power HEMTs

T Hashizume, K Nishiguchi, S Kaneki, J Kuzmik… - Materials science in …, 2018 - Elsevier
In this article, we review recent progress on AlGaN/GaN and InAlN/GaN metal-insulator-
semiconductor high-electron-mobility transistors (MIS-HEMTs) using Al-based oxides, nitride …

Dynamic on-resistance in GaN power devices: Mechanisms, characterizations, and modeling

S Yang, S Han, K Sheng… - IEEE Journal of Emerging …, 2019 - ieeexplore.ieee.org
Gallium nitride (GaN) power devices enable power electronic systems with enhanced power
density and efficiency. Dynamic on-resistance (R ON) degradation (or current collapse) …

p-GaN Gate HEMT With Surface Reinforcement for Enhanced Gate Reliability

L Zhang, Z Zheng, S Yang, W Song… - IEEE Electron Device …, 2020 - ieeexplore.ieee.org
By deploying a surface reinforcement layer (SRL) at the interface between Schottky metal
and p-GaN in the gate stack, a p-GaN gate high-electron-mobility transistor (HEMT) with …

1300 V normally-OFF p-GaN gate HEMTs on Si with high ON-state drain current

H Jiang, Q Lyu, R Zhu, P **ang… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
In this article, we demonstrate normally-OFF p-GaN gate high electron mobility transistors
(HEMTs) on Si with an ultrahigh breakdown voltage () and excellent saturation drain current …

High Vth and Improved Gate Reliability in P-GaN Gate HEMTs with Oxidation Interlayer

M Jia, B Hou, L Yang, F Jia, X Niu, J Du… - IEEE Electron …, 2023 - ieeexplore.ieee.org
In this letter, we apply an oxidation technique for p-GaN to a normally-off p-GaN/AlGaN/GaN
HEMT to improve the threshold voltage and gate reliability. Oxygen-plasma and low …

Passivation of III–V surfaces with crystalline oxidation

P Laukkanen, MPJ Punkkinen, M Kuzmin… - Applied Physics …, 2021 - pubs.aip.org
Control of interfacial physicochemical properties associated with device materials to
minimize the impact of point defects on device performance has been a dominant theme in …

Normally-off HEMTs With Regrown p-GaN Gate and Low-Pressure Chemical Vapor Deposition SiNx Passivation by Using an AlN Pre-Layer

Y Zhong, S Su, X Chen, Y Zhou, J He… - IEEE Electron …, 2019 - ieeexplore.ieee.org
Normally-off HEMTs have been fabricated with regrown p-GaN gate and SiN x passivation
by Low-pressure chemical vapor deposition (LPCVD) using an AlN pre-layer, featuring a …

High-voltage p-GaN HEMTs with off-state blocking capability after gate breakdown

H Jiang, R Zhu, Q Lyu, KM Lau - IEEE Electron Device Letters, 2019 - ieeexplore.ieee.org
In this letter, we report high-performance p-GaN HEMTs on Si with robust gate operation. For
the first time, the preserved OFF-state drain blocking capability has been demonstrated in p …