Symmetric and Excellent Scaling Behavior in Ultrathin n‐ and p‐Type Gate‐All‐Around InAs Nanowire Transistors

Q Li, C Yang, L Xu, S Liu, S Fang, L Xu… - Advanced Functional …, 2023 - Wiley Online Library
Complementary metal‐oxide‐semiconductor (CMOS) field‐effect transistors (FETs) are the
key component of a chip. Bulk indium arsenide (InAs) owns nearly 30 times higher electron …

Influence of Graded AlGaN sub-channel over the DC and Breakdown characteristics of a T-gated AlGaN/GaN/AlInN MOS-HEMT

V Sandeep, JC Pravin - Superlattices and Microstructures, 2021 - Elsevier
The impact of graded Al 0. 05 Ga 0. 95 N sub-channel over the DC characteristics of
AlGaN/GaN/AlInN Metal Oxide Semiconductor-High Electron Mobility Transistor (MOS …

Investigation of impact of gate underlap/overlap on the analog/RF performance of composite channel double gate MOSFETs

J Ajayan, D Nirmal, D Kurian, P Mohankumar… - Journal of Vacuum …, 2019 - pubs.aip.org
The influence of gate overlap and underlap on the DC/RF behavior of a composite channel
based double gate MOSFET (DG MOSFET) that can be used for RF/analog applications is …

Performance optimization of full swing adders for future DSP & machine learning applications using 16 nm CMOS process at high temperatures

K Manideep, B Abhinav, VM Gaddam… - 2022 IEEE …, 2022 - ieeexplore.ieee.org
This article reports the optimization of full-swing (rail-to-rail voltage swing) adders for the
efficient realization of booth multipliers that have been considered as the vital blocks for …

Influence of HfAlOx in DC, RF and Microwave Noise Performance of Dual-Channel Single-Gate InAs MOSHEMT

R Poornachandran, N Mohankumar… - Journal of Electronic …, 2021 - Springer
This paper analyzes the effect of a HfAlO x dielectric in a dual-channel (DC) single-gate (SG)
metal oxide semiconductor high-electron-mobility transistor (DCSG-MOSHEMT) on …

An Overview of Nanowire Field-Effect Transistors for Future Nanoscale Integrated Circuits

J Ajayan, D Nirmal, P Mohankumar… - Nanoelectronics for Next …, 2022 - taylorfrancis.com
Due to the outstanding electrostatic integrity of nanowire (NW) gate all-around (GAA) field-
effect transistors (FETs), these devices have emerged as the most promising transistor …

Negative Capacitance Field Effect Transistors for Future Low Power Electronics

D Nirmal, J Ajayan - Low-Dimensional Nanoelectronic Devices, 2022 - taylorfrancis.com
Traditional silicon-based CMOS field-effecttransistors (FETs) cannot satisfy the requirements
of future high-speed low-power integrated circuits due to their ultra–high-power …

Negative Capacitance Field Effect

D NIRMAL¹, J AJAYAN - Low-Dimensional Nanoelectronic …, 2022 - books.google.com
Traditional silicon-based CMOS field-effect transistors (FETs) cannot satisfy the
requirements of future high-speed low-power integrated circuits due to their ultra-high-power …

Ultra Low Power III-V Tunnel Field-Effect Transistors

J Ajayan, D Nirmal - … Devices and Technologies for Future Ultra …, 2021 - taylorfrancis.com
Tunnel field-effect transistors (TFETs) have emerged as a potential device technology to
replace conventional MOSFET technology in future ultra low power and high-speed …

Effect of Nickel material over the DC characteristics of a Silicon Nanowire Cylindrical MOSFET

JC Pravin, RS Jayanthi, JY Sri… - 2021 5th International …, 2021 - ieeexplore.ieee.org
This paper focuses on designing a Cylindrical Metal Oxide Semiconductor Field Effect
Transistor (MOSFET) using Sentaurus Technology Computer Aided Design (TCAD). By …