Block copolymers: Synthesis, self-assembly, and applications

H Feng, X Lu, W Wang, NG Kang, JW Mays - Polymers, 2017 - mdpi.com
Research on block copolymers (BCPs) has played a critical role in the development of
polymer chemistry, with numerous pivotal contributions that have advanced our ability to …

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

H Hu, M Gopinadhan, CO Osuji - Soft matter, 2014 - pubs.rsc.org
Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

Solvent vapor annealing of block polymer thin films

C Sinturel, M Vayer, M Morris, MA Hillmyer - Macromolecules, 2013 - ACS Publications
This Perspective provides a critical analysis of the current knowledge concerning solvent
vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that …

[HTML][HTML] Self-assembly of block copolymer thin films

JNL Albert, TH Epps III - Materials Today, 2010 - Elsevier
Block copolymers self-assemble on nanometer length scales, making them ideal for
emerging nanotechnologies. Many applications (eg, templating, membranes) require the …

100th anniversary of macromolecular science viewpoint: Block copolymer particles: Tuning shape, interfaces, and morphology

JJ Shin, EJ Kim, KH Ku, YJ Lee, CJ Hawker… - ACS Macro …, 2020 - ACS Publications
Confined assembly of block copolymers (BCPs) is receiving increasing attention due to the
ability to create unconventional morphologies that cannot be observed in the corresponding …

Block copolymer nanolithography: translation of molecular level control to nanoscale patterns

J Bang, U Jeong, DY Ryu, TP Russell… - Advanced …, 2009 - Wiley Online Library
Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly

S Maekawa, T Seshimo, T Dazai, K Sato… - Nature …, 2024 - nature.com
While block copolymer (BCP) lithography is theoretically capable of printing features smaller
than 10 nm, develo** practical BCPs for this purpose remains challenging. Herein, we …

Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large

K Koo, H Ahn, SW Kim, DY Ryu, TP Russell - Soft Matter, 2013 - pubs.rsc.org
The self-assembly of block copolymers (BCPs) is emerging as a promising route for
numerous applications to generate templates and scaffolds for the fabrication of …

Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions

E Han, KO Stuen, M Leolukman, CC Liu… - …, 2009 - ACS Publications
We report the induction of perpendicularly oriented cylindrical domains in PS-b-PMMA block
copolymer (BCP) films thicker than 100 nm by thermally annealing on a substrate modified …

Directed self-assembly and pattern transfer of five nanometer block copolymer lamellae

AP Lane, XM Yang, MJ Maher, G Blachut, Y Asano… - ACS …, 2017 - ACS Publications
The directed self-assembly (DSA) and pattern transfer of poly (5-vinyl-1, 3-benzodioxole-
block-pentamethyldisilylstyrene)(PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b …