Implementation of the density gradient quantum corrections for 3-D simulations of multigate nanoscaled transistors

AJ Garcia-Loureiro, N Seoane… - … on Computer-Aided …, 2011 - ieeexplore.ieee.org
An efficient implementation of the density-gradient (DG) approach for the finite element and
finite difference methods and its application in drift-diffusion (DD) simulations is described in …

Single donor electronics and quantum functionalities with advanced CMOS technology

X Jehl, YM Niquet, M Sanquer - Journal of Physics: Condensed …, 2016 - iopscience.iop.org
Recent progresses in quantum dots technology allow fundamental studies of single donors
in various semiconductor nanostructures. For the prospect of applications figures of merits …

Partially cylindrical fin field-effect transistor: a novel device for nanoscale applications

M Mehrad, AA Orouji - IEEE Transactions on Device and …, 2010 - ieeexplore.ieee.org
In this paper, we have proposed a new partially cylindrical fin field-effect transistor (PC-
FinFET), where the upper region of fins has partially cylindrical shape and the lower region …

An analytical compact model for Schottky-barrier double gate MOSFETs

M Balaguer, B Iñiguez, JB Roldán - Solid-state electronics, 2011 - Elsevier
An analytical and explicit compact model for undoped symmetrical silicon double gate
MOSFETs (DGMOSFETs) with Schottky barrier (SB) source and drain is presented. The SB …

Fin core dimensionality and corner effect in dual core gate-all-around FinFET

PS Das, D Deb, R Goswami, S Sharma, R Saha - Microelectronics Journal, 2024 - Elsevier
This article proposes investigation of low power performance of a fin field-effect transistor
(FinFET) with surrounding gates through a calibrated technology computer-aided design …

Equivalent Oxide Thickness of Trigate SOI MOSFETs With High- Insulators

FJG Ruiz, IM Tienda-Luna, A Godoy… - … on Electron Devices, 2009 - ieeexplore.ieee.org
The evolution of traditional metal–oxide–semiconductor field-effect transistors (MOSFETs)
from planar single-gate devices into 3-D ones with multiple gates and high-κ insulators …

3D analytical modelling of subthreshold characteristics in vertical Multiple-gate FinFET transistors

R Ritzenthaler, F Lime, O Faynot, S Cristoloveanu… - Solid-state …, 2011 - Elsevier
In this work, a model is developed in order to obtain analytical expressions of the
subthreshold characteristics of advanced Pi-gate FET transistors. Based on the solution of …

An Analytical Model for Surrounding-Gate Transistors That Includes Quantum and Velocity Overshoot Effects

JB Roldán, F Gamiz, F Jiménez-Molinos… - IEEE transactions on …, 2010 - ieeexplore.ieee.org
A new analytical model is presented for the inversion charge of surrounding-gate transistors
(SGTs). Quantum effects are taken into account by means of a modified capacitance model …

Modeling the equivalent oxide thickness of surrounding gate SOI devices with high-κ insulators

IM Tienda-Luna, FJG Ruiz, L Donetti, A Godoy… - Solid-State …, 2008 - Elsevier
In this work, the behavior of the gate insulator capacitance of different Surrounding Gate SOI
devices with square and circular cross-sections has been studied. It is shown that the …

An analytical model for square GAA MOSFETs including quantum effects

E Moreno, JB Roldan, FG Ruiz, D Barrera, A Godoy… - Solid-State …, 2010 - Elsevier
In this paper we introduce an analytical model for square Gate-All-Around (GAA) MOSFETs
including quantum effects. With the model developed, it is possible to provide an analytical …