Refined thermal stability of Cr/Sc multilayers with Si (Be) barrier layers
EO Filatova, SS Sakhonenkov, AV Solomonov… - Applied Surface …, 2023 - Elsevier
Abstract Effect of Si and Be barrier layers on the intermixing of thin Cr and Sc layers, as-
deposited and after annealing in a wide range of temperatures was considered using X-ray …
deposited and after annealing in a wide range of temperatures was considered using X-ray …
Increasing the thermal stability of a Cr/Sc multilayer by nitriding
EO Filatova, SS Sakhonenkov, AV Solomonov… - Applied Surface …, 2024 - Elsevier
The effect of nitridation of Cr, Sc or both layers in the ultrathin multilayer structure Sc/Cr on
the intermixing of thin Cr and Sc layers, as-deposited and after annealing at different …
the intermixing of thin Cr and Sc layers, as-deposited and after annealing at different …
Perspective: Towards single shot time-resolved microscopy using short wavelength table-top light sources
Time-resolved imaging allows revealing the interaction mechanisms in the microcosm of
both inorganic and biological objects. While X-ray microscopy has proven its advantages for …
both inorganic and biological objects. While X-ray microscopy has proven its advantages for …
Identifications of extreme ultraviolet spectra of Br-like to Ni-like neodymium ions using an electron beam ion trap
Accurate extreme ultraviolet spectra of open N-shell neodymium (Nd) ions were recorded at
the electron beam ion trap facility of the National Institute of Standards and Technology. The …
the electron beam ion trap facility of the National Institute of Standards and Technology. The …
Systematic observation of EUV spectra from highly charged lanthanide ions in the Large Helical Device
C Suzuki, F Koike, I Murakami, N Tamura, S Sudo - Atoms, 2018 - mdpi.com
We have systematically observed extreme ultraviolet (EUV) spectra from highly charged ions
of nine lanthanide elements with atomic numbers from 60–70 in optically thin plasmas …
of nine lanthanide elements with atomic numbers from 60–70 in optically thin plasmas …
Characteristics of discharge and beyond extreme ultraviolet spectra of laser induced discharge gadolinium plasma
W Junwu, W **nbing, Z Duluo, VS Zakharov - Optics & Laser Technology, 2021 - Elsevier
The gadolinium (Gd) plasma is a potential beyond-EUV (BEUV) source for the extension of
extreme ultraviolet lithography at 13.5 nm. A laser induced discharge plasma (LDP) is an …
extreme ultraviolet lithography at 13.5 nm. A laser induced discharge plasma (LDP) is an …
Dependence of spectral purity of Gd plasma emission around 6.7 nm on laser irradiation conditions
Z Wen, Z **e, C Wang, Q Zhang, M Si, X Song, Y Dou… - Vacuum, 2024 - Elsevier
Gadolinium is a compelling candidate for the next-generation 6. x nanolithography light
source. We present a systematically study on the spectral purity at 6.7 nm in the gadolinium …
source. We present a systematically study on the spectral purity at 6.7 nm in the gadolinium …
Thomson scattering measurements of electron temperature and electron density in laser-driven Gd plasmas
In this study, we demonstrate the laser intensity scaling of electron temperature in Gd laser-
produced plasmas (LPPs) through experiment and simulation. The spatial and temporal …
produced plasmas (LPPs) through experiment and simulation. The spatial and temporal …
Theoretical study of soft X-ray emission and dynamics of laser-induced plasma of double stream gas puff
VS Zakharov, SV Zakharov - The European Physical Journal D, 2021 - Springer
The double stream gas puff-based laser-produced plasma is studied as a source of soft X-
ray radiation in nm wavelength spectral range. Dynamics of plasma induced by Nd: YAG …
ray radiation in nm wavelength spectral range. Dynamics of plasma induced by Nd: YAG …
XUV spectra of 2nd transition row elements: identification of 3d–4p and 3d–4f transition arrays
R Lokasani, E Long, O Maguire… - Journal of Physics B …, 2015 - iopscience.iop.org
The use of laser produced plasmas (LPPs) in extreme ultraviolet/soft x-ray lithography and
metrology at 13.5 nm has been widely reported and recent research efforts have focused on …
metrology at 13.5 nm has been widely reported and recent research efforts have focused on …