Ever since the discovery of black silicon, scientists around the world have been trying to
come up with novel, cost-effective methods of utilizing this super material in a variety of …

High-aspect-ratio silicon micro-and nanostructures are technologically relevant in several
applications, such as microelectronics, microelectromechanical systems, sensors …

High aspect ratio nanostructuring requires high precision pattern transfer with highly
directional etching. In this work, we demonstrate the fabrication of structures with ultra-high …

Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to
macroscale feature dimensions, is essential for producing functional interfaces for many …

The ability to directly print 3D microstructures across the surface of large dimension
substrates opens up numerous possibilities not feasible with conventional 2D or 2.5 D …

Diffractive optics play a key role in hard X‐rays imaging for which many scientific,
technological, and biomedical applications exist. Herein, high‐aspect‐ratio microfabrication …

Metal-assisted chemical etching (MACE) has received much attention from researchers
because it can be used to fabricate plasma-free anisotropic etching profiles for …

In the present work, we perform finite element simulations to investigate the ablated surface
morphology of silicon by nanosecond pulsed laser ablation using low laser fluences ranging …

Wet etching is an essential and complex step in semiconductor device processing. Metal-
Assisted Chemical Etching (MacEtch) is fundamentally a wet but anisotropic etching method …

Methods for the mass fabrication of 3D silicon (Si) microstructures with a 100 nm resolution
are developed using scanning probe lithography (SPL) combined with metal‐assisted …