3D modeling of feature-scale fluorocarbon plasma etching in silica
Fluorocarbon dry etching of vertical silica-based structures is essential to the fabrication of
advanced complementary metal-oxide-semiconductor and dynamic random access memory …
advanced complementary metal-oxide-semiconductor and dynamic random access memory …
Unified feature scale model for etching in SF6 and Cl plasma chemistries
X Klemenschits, S Selberherr… - 2018 Joint International …, 2018 - ieeexplore.ieee.org
A novel unified feature-scale model for inductive plasma etching is presented. The semi-
empirical model simplifies simulations by considering only surface reactions and ignoring …
empirical model simplifies simulations by considering only surface reactions and ignoring …