Semi-Supervised Deep Kernel Active Learning for Material Removal Rate Prediction in Chemical Mechanical Planarization

C Lv, J Huang, M Zhang, H Wang, T Zhang - Sensors, 2023 - mdpi.com
The material removal rate (MRR) is an important variable but difficult to measure in the
chemical–mechanical planarization (CMP) process. Most data-based virtual metrology (VM) …

Prediction of Material Removal Rate Using Phase Partition and Semi-supervised Regression

C Lv, J Huang, H Wang, T Zhang - 2022 China Automation …, 2022 - ieeexplore.ieee.org
In the Chemical Mechanical Planarization (CMP) process, the Material Removal Rate (MRR)
is an important indicator of polishing performance. However, MRR is difficult to be …