Silicon nanowire GAA-MOSFET: A workhorse in nanotechnology for future semiconductor devices

K Bhol, B Jena, U Nanda - Silicon, 2022 - Springer
In today's world, semiconductor nanowire GAA-MOSFET devices have stimulated a lot of
scientific research interest in the field of semiconductor. It has been observed as one of the …

Nanowire array-based MOSFET for future CMOS technology to attain the ultimate scaling limit

K Bhol, U Nanda - Silicon, 2022 - Springer
Silicon nanowire (SiNW) structures are the essential foundations of the next generation
highly efficient and lowcost electronic devices because of their specific chemical, optical …

Analysis of barrier layer thickness on performance of In1–x Ga x as based gate stack cylindrical gate nanowire MOSFET

SK Sharma, J Singh, B Raj… - … of Nanoelectronics and …, 2018 - ingentaconnect.com
In this paper, InGaAs/InP heterostructure based Cylindrical Gate Nanowire MOSFETs
(CGNWMOSFET) is designed and its performance has been analyzed using silvaco ATLAS …

Improved switching speed of a CMOS inverter using work-function modulation engineering

B Jena, S Dash, GP Mishra - IEEE transactions on electron …, 2018 - ieeexplore.ieee.org
This paper presents a detailed numerical analysis of work-function modulated cylindrical
gate metal-oxide-semiconductor field-effect transistor (MOSFET)-based CMOS inverter …

A compact model of gate capacitance in ballistic gate-all-around carbon nanotube field effect transistors

A Dixit, N Gupta - International Journal of Engineering, 2021 - ije.ir
This paper presents a one-dimensional analytical model for calculating gate capacitance in
Gate-All-Around Carbon Nanotube Field Effect Transistor (GAA-CNFET) using electrostatic …

Inner-gate-engineered GAA MOSFET to enhance the electrostatic integrity

B Jena, S Dash, SR Routray, GP Mishra - Nano, 2019 - World Scientific
Gate-all-around (GAA) MOSFETs are the best multi-gate MOSFET structure due to their
strong electrostatic control over the channel. The electrostatic controllability can be …

Cryogenic analysis of junctionless nanowire MOSFET during underlap in lower technology nodes

TS Sasank, PR Ganesh, NP Kumar… - Journal of Physics …, 2021 - iopscience.iop.org
This paper presents a cryogenic analysis of Junction less Under lapped Nanowire
MOSFETs in lower technology nodes. The temperature dependent analysis is carried out to …

Dual material gate engineering to reduce DIBL in cylindrical gate all around Si nanowire MOSFET for 7-nm gate length

Sanjay, B Prasad, A Vohra - Semiconductors, 2020 - Springer
In this work, drain current ID for 7-nm gate length dual-material (DM) cylindrical gate all
around (CGAA) silicon nanowire (SiNW) has been studied and simulation results are …

[HTML][HTML] Triple and quadruple metal gate work function engineering to improve the performance of junctionless double surrounding gate In0. 53Ga0. 47As nanotube …

V Kumar, A Vohra - Physics Letters A, 2024 - Elsevier
In line with Moore's Law and the International Roadmap for Devices and Systems (IDRS),
shrinking MOSFET dimensions to the 3 nm technology node requires the introduction and …

Conical surrounding gate MOSFET: a possibility in gate-all-around family

B Jena, BS Ramkrishna, S Dash… - Advances in Natural …, 2016 - iopscience.iop.org
In this paper a new conical surrounding gate metal-oxide-semiconductor field effect
transistor (MOSFET) with triple-material gate has been proposed and verified using TCAD …