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Coefficient of thermal expansion and elastic modulus of thin films
The coefficient of thermal expansion (CTE), biaxial modulus, and stress of some amorphous
semiconductors (a-Si: H, aC: H, a-Ge: H, and a-GeC x: H) and metallic (Ag and Al) thin films …
semiconductors (a-Si: H, aC: H, a-Ge: H, and a-GeC x: H) and metallic (Ag and Al) thin films …
[PDF][PDF] Paper I: Ultrathin Resonant-Cavity-Enhanced Solar Cells with Amorphous Germanium Absorbers
Ultrathin 1D optical cavities enable strong and spectrally broad absorption in solar cells.
This approach requires highly absorptive materials as well as tailoring of the phase shifts …
This approach requires highly absorptive materials as well as tailoring of the phase shifts …
High performance glow discharge of large
P Wickboldt, D Pang, W Paul, JH Chen… - Journal of Applied …, 1997 - pubs.aip.org
Radio frequency glow discharge chemical vapor deposition has been used to deposit thin
films of a-Si 1− x Ge x: H which possess optoelectronic properties that are greatly improved …
films of a-Si 1− x Ge x: H which possess optoelectronic properties that are greatly improved …
Organometallic Chemical Vapor Deposition of Germanium from a Cyclic Germylene, 1,3-Di-tert-butyl-1,3,2-diazagermolidin-2-ylidine
S Vepřek, J Prokop, F Glatz, R Merica… - Chemistry of …, 1996 - ACS Publications
Investigations into the kinetics and mechanism of the thermal decomposition of the novel
organometallic precursor 1, 3-di-tert-butyl-1, 3, 2-diazagarmolidin-2-ylidine are reported. On …
organometallic precursor 1, 3-di-tert-butyl-1, 3, 2-diazagarmolidin-2-ylidine are reported. On …
Stress and thermomechanical properties of amorphous hydrogenated germanium thin films deposited by glow discharge
FC Marques, P Wickboldt, D Pang, JH Chen… - Journal of applied …, 1998 - pubs.aip.org
Stress measurements of a-Ge: H thin films deposited by rf glow discharge using a large
variety of deposition conditions are reported. It was observed that the stress of the films is …
variety of deposition conditions are reported. It was observed that the stress of the films is …
Density of states in hydrogenated amorphous germanium seen via optical absorption spectra
We propose and discuss a deconvolution procedure to analyze quantitatively optical
absorption spectra. This procedure is used to determine the density of states distribution in …
absorption spectra. This procedure is used to determine the density of states distribution in …
[PDF][PDF] Low-temperature micro-opto-electro-mechanical technologies for temperature sensitive substrates
M Martyniuk - 2006 - research-repository.uwa.edu.au
The salient feature of next generation infrared (IR) on-chip integrated sensors is likely to be
sensitivity in a narrow wavelength band that is tuneable over a selected range of the IR …
sensitivity in a narrow wavelength band that is tuneable over a selected range of the IR …
Optimization of process parameters for the deposition of improved a‐Ge:H by dc magnetron sputtering
T Drüsedau, B Schröder - Journal of applied physics, 1994 - pubs.aip.org
A detailed study of the influence of hydrogen and argon partial pressures, substrate
temperature, and dc power on the composition and the optoelectronic properties of …
temperature, and dc power on the composition and the optoelectronic properties of …
Films thickness effect on structural and optoelectronic properties of hydrogenated amorphous germanium (a-Ge: H)
Thin films of hydrogenated amorphous germanium (a-Ge: H) deposited at high growth rate
by radiofrequency (RF) glow discharge with 1sccm GeH4 diluted in 40sccm H2 have been …
by radiofrequency (RF) glow discharge with 1sccm GeH4 diluted in 40sccm H2 have been …
Influence of plasma conditions on the defect formation mechanism in amorphous hydrogenated silicon
The variation of a‐Si: H film quality, deposited by a rf glow discharge of pure silane, is
examined as a function of the interelectrode distance for two different pressures. Constant …
examined as a function of the interelectrode distance for two different pressures. Constant …