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Fault and self-repair for high reliability in die-to-die interconnection of 2.5 D/3D IC
R Song, J Zhang, Z Zhu, G Shan, Y Yang - Microelectronics Reliability, 2024 - Elsevier
Bringing dies closer by die-to-die interconnection is a way that reduces latency and energy
per bit transmitted, while increasing bandwidth per mm of chip. Heterogeneous integration …
per bit transmitted, while increasing bandwidth per mm of chip. Heterogeneous integration …
Abnormal grain growth of (110)-oriented perpendicular nanotwinned copper into ultra-large grains at low temperatures
Large grain sizes can be achieved by abnormal grain growth (AGG), but its application in Cu
interconnect is limited due to the demand for high temperatures. In this study, we found that …
interconnect is limited due to the demand for high temperatures. In this study, we found that …
Nonvolatile spin field effect transistor based on multiferroic heterostructure
X Zhang, B Liu, J Huang, X Cao, Y Zhang, ZX Guo - Physical Review B, 2024 - APS
In this study, we present first-principles calculations that introduce a nonvolatile spin field
effect transistor (spin-FET) utilizing a van der Waals multiferroic heterostructure, specifically …
effect transistor (spin-FET) utilizing a van der Waals multiferroic heterostructure, specifically …
Anisotropy-induced reliability issues and grain orientation control in Sn-based micro solder joints for advanced packaging
Y Qiao, N Zhao - Journal of Materials Science & Technology, 2024 - Elsevier
Technological advancements and the emphasis on reducing the use of hazardous
materials, such as Pb, have led to the widely use of Sn-based Pb-free solder in advanced …
materials, such as Pb, have led to the widely use of Sn-based Pb-free solder in advanced …
Ultrathick MA2N4(M'N) Intercalated Monolayers with Sublayer‐Protected Fermi Surface Conduction States: Interconnect and Metal Contact Applications
Recent discovery of ultrathick MoSi2N4 (MoN) n monolayers open up an exciting platform to
engineer two‐dimensional (2D) material properties via intercalation architecture. In this …
engineer two‐dimensional (2D) material properties via intercalation architecture. In this …
Studies of polixetonium chloride as a novel, hypotoxic and single additive of copper electronic plating for microvia void-free filling in printed circuit board application
ZY Wang, D Yu, L **, JQ Yang, DP Zhan… - Journal of Manufacturing …, 2024 - Elsevier
The void-free filling of microvia through copper electronic plating in printed circuit board
application relies critically on multi-component additives including suppressor, accelerator …
application relies critically on multi-component additives including suppressor, accelerator …
[HTML][HTML] Recrystallization and grain growth in Cu-Cu joints under electromigration at low temperatures
The behavior of recrystallization and grain growth was examined in Cu-Cu joints during
electromigration at 150° C. Recrystallization and grain growth were observed in all the joints …
electromigration at 150° C. Recrystallization and grain growth were observed in all the joints …
[HTML][HTML] Coupling effect between electromigration and joule heating on the failure of ball grid array in 3D integrated circuit technology
Abstract Ball Grid Array (BGA) packaging method has been widely used in microelectronic
devices, and electromigration (EM) in BGA is a crucial reliability issue, determining the …
devices, and electromigration (EM) in BGA is a crucial reliability issue, determining the …
[HTML][HTML] Cu–Cu joint with great strength using In/Sn–58Bi hybrid soldering at low temperature (90 C)
YA Shen - Journal of Materials Research and Technology, 2024 - Elsevier
This study investigates Cu single-sided solder joints using hybrid soldering (In+ Sn58Bi) at
reflow temperatures ranging from 80 to 130° C. The wetting angles of 27° at 90° C and 22° …
reflow temperatures ranging from 80 to 130° C. The wetting angles of 27° at 90° C and 22° …
[HTML][HTML] Minor Ag induced shear performance alternation in BGA structure Cu/SnBi/Cu solder joints under electric current stressing
W Li, L Mo, X Li, J Wang, H Qin, S He - Journal of Materials Research and …, 2023 - Elsevier
In this work, the effect of minor Ag addition on shear performance of ball grid array (BGA)
structure Cu/SnBi/Cu solder joints under electric current stressing was investigated. The …
structure Cu/SnBi/Cu solder joints under electric current stressing was investigated. The …