Atomic layer deposition (ALD) for high‐quality conformal inorganic thin films is one of the
cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less …

As the patterning technology used for manufacturing highly integrated devices continues to
develop in the current semiconductor market, sophisticated technology nodes of 5 nm or …

Molecular layer deposition (MLD) provides the opportunity to perform condensation
polymerization one vaporized monomer at a time for the creation of precise, selective …

Oxidative molecular layer deposition (oMLD) promises to enable molecular-level control of
polymer structure through monomer-by-monomer growth via sequential, self-limiting, gas …

Atomic layer deposition (ALD) is one of the premier methods to synthesize ultra‐thin
materials on complex surfaces. The technique allows for precise control of the thickness …

Organic thin films formed by molecular layer deposition (MLD) are important for next-
generation electronics, energy storage, photoresists, protective barriers and other …

The lifetime of lithium-ion batteries can be extended by applying protective coatings to the
cathode's surface. Many studies explore atomic layer deposition (ALD) for this purpose …

Water and oxygen stability has been one of the major bottlenecks in practical application of
perovskite quantum dots (PeQDs). Recently, ultra-thin alumina via atomic layer deposition …

Molecular layer deposition is increasingly used to functionalize the surface of planar and 3D
porous substrates. This study explores functionalized 'alucone'hybrid layers grown on …

This study investigates the presence of titanium oxynitride bonds in titanium dioxide (TiO2)
thin films grown by atomic layer deposition (ALD) using tetrakis dimethyl amino titanium …