Atomic Layer Deposition: An Overview | Chemical Reviews ACS ACS Publications C&EN CAS
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Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …

With the increasing importance of wireless microelectronic devices the need for on‐board
power supplies is evidently also increasing. Possible candidates for microenergy storage …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

The present invention provides for sequential chemical vapor deposition by employing a
reactor operated at low pressure, a pump to remove excess reactants, and a line to …

Bear, LLP (60) Division of application No. 09/291,807, filed on Apr. 14, Ca 1999, now Pat.
No. 6,342,277, which is a continuation-in-(57) ABSTRACT part of application No …

The present invention provides for sequential chemical vapor deposition by employing a
reactor operated at low pressure, a pump to remove excess reactants, and a line to …

Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating
reactions between gas phase precursor molecules and a solid surface. The self-limiting …