System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,003,758, 2006 - Google Patents
There are many inventions described and illustrated herein. In one aspect, the present
invention is directed to a technique of, and system for simulating, verifying, inspecting …
invention is directed to a technique of, and system for simulating, verifying, inspecting …
System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,117,478, 2006 - Google Patents
In one aspect, the present invention is directed to a technique of and system for simulating,
verifying, inspecting, char acterizing, determining and/or evaluating the lithographic designs …
verifying, inspecting, char acterizing, determining and/or evaluating the lithographic designs …
System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,111,277, 2006 - Google Patents
There are many inventions described and illustrated herein. In one aspect, the present
invention is directed to a technique of, and system for simulating, verifying, inspecting …
invention is directed to a technique of, and system for simulating, verifying, inspecting …
System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,120,895, 2006 - Google Patents
There are many inventions described and illustrated herein. In one aspect, the present
invention is directed to a technique of, and system for simulating, verifying, inspecting …
invention is directed to a technique of, and system for simulating, verifying, inspecting …
System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,117,477, 2006 - Google Patents
In one aspect, the present invention is directed to a technique of and system for simulating,
verifying, inspecting, char acterizing, determining and/or evaluating the lithographic designs …
verifying, inspecting, char acterizing, determining and/or evaluating the lithographic designs …
Method and system for critical dimension uniformity using charged particle beam lithography
R Pearman, RC Pack, A Fujimura - US Patent 9,038,003, 2015 - Google Patents
(51) Int. Cl. A method for mask data preparation or mask process correc G06F
17/50(2006.01) tion is disclosed in which a set of charged particle beam shots GO3F …
17/50(2006.01) tion is disclosed in which a set of charged particle beam shots GO3F …
System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,114,145, 2006 - Google Patents
In one aspect, the present invention is directed to a technique of and system for simulating,
verifying, inspecting, char acterizing, determining and/or evaluating the lithographic designs …
verifying, inspecting, char acterizing, determining and/or evaluating the lithographic designs …
System and method for lithography simulation
J Ye, YW Lu, Y Cao, L Chen, X Chen - US Patent 7,873,937, 2011 - Google Patents
(60) Provisional application No. 60/509,600, filed on Oct. phy simulation, inspection,
characterization and/or evalua 7, 2003. tion of the optical characteristics and/or properties …
characterization and/or evalua 7, 2003. tion of the optical characteristics and/or properties …
Method and system for forming a pattern on a reticle using charged particle beam lithography
A Fujimura - US Patent 9,341,936, 2016 - Google Patents
A method and system for fracturing or mask data preparation is disclosed in which a desired
substrate pattern for a substrate is input. A plurality of charged particle beam shots is then …
substrate pattern for a substrate is input. A plurality of charged particle beam shots is then …
Method and system for dimensional uniformity using charged particle beam lithography
A Fujimura, K Hagiwara, RC Pack - US Patent 9,343,267, 2016 - Google Patents
5,173,582 5,334.282 5,863,682 5,885,748 6,218,671 6,372.391 6,433,348 6,495,841
6,557,162 6,610,989 6,627,366 6,891, 175 7,386,830 7,435,517 7,536,664 7,703,069 …
6,557,162 6,610,989 6,627,366 6,891, 175 7,386,830 7,435,517 7,536,664 7,703,069 …