Titanium nitride films were deposited by reactive magnetron sputtering on Si (100) wafers,
glass and Ti6Al4V substrates. The film deposition was carried out in a gas mixture of Ar and …

The magnetron sputtering deposition of CrN coatings is environmental friendliness and has
high surface gloss. Therefore it is a promising alternative to the electroplating deposition of …

This paper reports the results of the influence of bilayer period (Λ) and total thickness (f) on
the corrosion resistance of magnetron-sputtered CrN/Cr multilayers. Corrosion tests were …

The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based
thin films on brass substrates for the purpose of corrosion-protective coating was …

CrAlSiN nanocomposite coatings with different (Al+ Si)/Cr atomic ratios were deposited by a
lateral rotating cathode arc technique. Their composition, structural, and mechanical …

Cr/CrN nano-multilayers were grown on H13 steel and silicon (100), having different periods
(Λ), at room temperature using the unbalanced magnetron sputtering technique by varying …

Arc ion plating (Ti0. 34, Al0. 66) N and (Cr0. 28, Al0. 72) N coatings are deposited onto
cemented carbide substrates at 350° C. The crystal structure and microstructure of the …

TiN films were prepared by the Cathodic arc evaporation deposition method under different
negative substrate bias. AFM image analyses show that the growth mode of biased coatings …

To contemplate an alternative approach for the minimization of diffusion at high temperature,
present findings impart viability of room-temperature deposited reactively sputtered ScN thin …

Chromium nitride (CrN) films were deposited on Si wafers by arc ion plating at various
negative bias voltages and several groups of N 2∕ Ar gas flux ratios and chamber gas …