SU-8 has become the favourite photoresist for high-aspect-ratio (HAR) and three-
dimensional (3D) lithographic patterning due to its excellent coating, planarization and …

Microfluidics is an emerging field that has given rise to a large number of scientific and
technological developments over the last few years. This review reports on the use of …

The development of polymer micromachining technologies that complement traditional
silicon approaches has enabled the broadening of microelectromechanical systems (MEMS) …

Since its introduction in the nineties, the negative resist SU‐8 has been increasingly used in
micro‐and nanotechnologies. SU‐8 has made the fabrication of high‐aspect ratio structures …

The fabrication of multi-level SU-8 microstructures using multiple coating and exposure
steps and a single develo** step has been achieved for up to six layers of SU-8 …

This paper describes a novel fabrication method for the manufacture of three-dimensional
(3D) interconnected microchannels. The fabrication is based on a full wafer polymer …

The fabrication of three-dimensional (3D) microfluidic networks entirely made of SU-8 with
integrated electrodes is reported. The described technology allows the fabrication of …

This paper describes a novel fabrication process based on successive wafer-level bonding
and releasing steps for stacking several patterned layers of the negative photoresist EPON …

The following paper describes a sacrificial layer method for the manufacturing of microfluidic
devices in polyimide and SU-8. The technique uses heat-depolymerizable polycarbonates …

A representative fabrication processing of SU-8 photoresist, Ultraviolet (UV) lithography is
usually composed of spin coat, soft bake, UV exposure, post exposure bake (PEB) …