Structuring of Si into multiple scales by metal‐assisted chemical etching

RP Srivastava, DY Khang - Advanced Materials, 2021‏ - Wiley Online Library
Structuring Si, ranging from nanoscale to macroscale feature dimensions, is essential for
many applications. Metal‐assisted chemical etching (MaCE) has been developed as a …

The advanced progress of single-atom photocatalysts for energy conversion and environmental remediation.

Y Liu, N Sun, H Ji, K Wang, A Zhang, Y Li… - Materials Today Physics, 2024‏ - Elsevier
Single-atom photocatalysts inject new vitality into the field of photocatalysis. Moreover, due
to their unique properties and advantages, single-atom photocatalysts have tremendous …

Recent advances in selective laser–material interaction for biomedical device applications

SH Um, SW Hwang, CP Grigoropoulos… - Applied Physics …, 2022‏ - pubs.aip.org
Lasers that exhibit monochromaticity, directionality, coherence, and focusability have been
used in health care and defense industries for over five decades. Recently, the application of …

Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors

S Znati, J Wharwood, KG Tezanos, X Li, PK Mohseni - Nanoscale, 2024‏ - pubs.rsc.org
Metal-assisted chemical etching (MacEtch) has emerged as a versatile technique for
fabricating a variety of semiconductor nanostructures. Since early investigations in 2000 …

CMOS-compatible electrochemical nanoimprint: High throughput fabrication of ordered microstructures on semiconductor wafer by using a glassy carbon mold

W Sun, H Xu, L Han, C Wang, Z Ye, JJ Su, YF Wu… - Electrochimica …, 2023‏ - Elsevier
Metal assisted chemical etching (MACE), as an emerging wet chemical etching method for
fabricating semiconductor micro/nano-structures (MNS), has attracted wide attentions …

Catalytic properties of chemically modified graphene sheets to enhance etching of Ge surface in water

R Mikurino, A Ogasawara, T Hirano… - The Journal of …, 2020‏ - ACS Publications
We examined chemical etching of the Ge surface assisted by single sheets of chemically
modified graphene in O2-containing water. Three types of graphene sheets were used …

Vapor-phase chemical etching of silicon assisted by graphene oxide for microfabrication and microcontact printing

W Kubota, R Yamaoka, T Utsunomiya… - ACS Applied Nano …, 2022‏ - ACS Publications
Chemical etching of silicon assisted by a number of catalysts is attracting increasing
attention in the fabrication of silicon micro–nanostructures. In practical applications, metal …

Rapid graphene oxide assisted chemical etching of silicon in HF/H2O2 solution

Y Xu, Q Zhao, J Chen, J Zhang, B Xu - Physica Scripta, 2024‏ - iopscience.iop.org
In recent years, graphene oxide assisted etching silicon has been considered a potential
method to replace metal-assisted chemical etching. This work demonstrated the catalytic …

Metal‐Organic Framework Membrane Hybridized with Graphitic Materials for Gas Separation

E Choi, O Kwon, C Hoo Lee, D Woo Kim - ChemPlusChem, 2023‏ - Wiley Online Library
Metal‐organic frameworks (MOFs) are an exceptional class of crystalline materials that have
been extensively used to fabricate membranes for various applications such as gas …

Fabrication of zinc substrate encapsulated by fluoropolyurethane and its drag-reduction enhancement by chemical etching

Y Li, Z Cui, Q Zhu, S Narasimalu, Z Dong - Coatings, 2020‏ - mdpi.com
A fluoropolyurethane-encapsulated process was designed to rapidly fabricate low-flow
resistance surfaces on the zinc substrate. For the further enhancement of the drag-reduction …