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Recent developments in photoresists for extreme-ultraviolet lithography
This report describes recent developments and current needs in the field of high-resolution
photopolymers and photomolecules briefly describing prior generation lithographic …
photopolymers and photomolecules briefly describing prior generation lithographic …
Photoresist and method of manufacture
CY Liu, CY Chang, CC Chen, YH Chen - US Patent 9,543,147, 2017 - Google Patents
(57) ABSTRACT A system and method for anti-reflective layers is provided. In an
embodiment the anti-reflective layer comprises a floating additive in order to form a floating …
embodiment the anti-reflective layer comprises a floating additive in order to form a floating …
[BUKU][B] Fundamentals of microfabrication: the science of miniaturization
MJ Madou - 2018 - books.google.com
MEMS technology and applications have grown at a tremendous pace, while structural
dimensions have grown smaller and smaller, reaching down even to the molecular level …
dimensions have grown smaller and smaller, reaching down even to the molecular level …
[BUKU][B] Manufacturing techniques for microfabrication and nanotechnology
MJ Madou - 2011 - taylorfrancis.com
Designed for science and engineering students, this text focuses on emerging trends in
processes for fabricating MEMS and NEMS devices. The book reviews different forms of …
processes for fabricating MEMS and NEMS devices. The book reviews different forms of …
Polymer and a forming method of a micro pattern using the same
JC Jung, MS Kim, HG Kim, CH Roh, GS Lee… - US Patent …, 2001 - Google Patents
US6316162B1 - Polymer and a forming method of a micro pattern using the same - Google
Patents US6316162B1 - Polymer and a forming method of a micro pattern using the same …
Patents US6316162B1 - Polymer and a forming method of a micro pattern using the same …
Polymers for photoresist and photoresist compositions using the same
CH Roh, JC Jung - US Patent 6,569,971, 2003 - Google Patents
US patent application Ser. No. 08/992,033, Jung et al., filed Dec. 17, 1997. US patent
application Ser. No. 09/000,984, Jung et al., filed Dec. 30, 1997. US patent application Ser …
application Ser. No. 09/000,984, Jung et al., filed Dec. 30, 1997. US patent application Ser …
Polymers for photoresist and photoresist compositions using the same
CH Roh, JC Jung - US Patent 6,987,155, 2006 - Google Patents
3.370, 047 A 2/1968 Raines 3,715,330 A 2/1973 Nogami et al. 4,011,386 A 3/1977
Matsumoto et al. 4,106,943 A 8/1978 Ikeda et al. 4,126,738 A 11/1978 Gaylord 4,202.955 A …
Matsumoto et al. 4,106,943 A 8/1978 Ikeda et al. 4,126,738 A 11/1978 Gaylord 4,202.955 A …
[BUKU][B] Microlithography: science and technology
BW Smith, K Suzuki - 2018 - taylorfrancis.com
This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …
balanced treatment of theoretical and operational considerations, from elementary concepts …
Chemical amplification resists: History and development within IBM
H Ito - IBM Journal of research and development, 1997 - ieeexplore.ieee.org
The chemical amplification concept was invented at IBM Research and quickly brought into
use in the production of dynamic random access memory devices in the company. It has …
use in the production of dynamic random access memory devices in the company. It has …
Photoswitching of basicity
MV Peters, RS Stoll, A Kühn… - Angewandte Chemie …, 2008 - Wiley Online Library
The ability to control function at the molecular level by means of external stimuli is one of the
key requirements for the development of “smart” devices and materials. In particular, the use …
key requirements for the development of “smart” devices and materials. In particular, the use …