A review of thickness measurements of thick transparent layers using optical interferometry

J Park, JA Kim, H Ahn, J Bae, J ** - International Journal of Precision …, 2019 - Springer
Thickness is a typical parameter related to length, of which measurements are conducted in
various industrial fields, such as the automotive, aviation, ship-building, semiconductor, and …

Sub-resolution contrast in neutral helium microscopy through facet scattering for quantitative imaging of nanoscale topographies on macroscopic surfaces

SD Eder, A Fahy, MG Barr, JR Manson, B Holst… - Nature …, 2023 - nature.com
Nanoscale thin film coatings and surface treatments are ubiquitous across industry, science,
and engineering; imbuing specific functional or mechanical properties (such as corrosion …

Characterization of through-silicon vias using laser terahertz emission microscopy

KJP Jacobs, H Murakami, F Murakami, K Serita… - Nature …, 2021 - nature.com
Abstract Three-dimensional (3D) complementary metal–oxide–semiconductor (CMOS)
integration could enable device scaling beyond the limits of conventional 2D CMOS …

Three-dimensional topography of high-aspect ratio trenches by sample-induced aberration-compensable coherence scanning interferometry

J Ma, Q Yuan, Z Gao, X Huo, Z Xu, J Zhang, X Fan… - ACS …, 2024 - ACS Publications
Nondestructive three-dimensional topography of high-aspect ratio structures presents
significant challenges, particularly in accurately capturing the bottom topography. Here, a …

Topography reconstruction of high aspect ratio silicon trench array via near-infrared coherence scanning interferometry

J Ma, X Huo, J Zhang, X Fan, Z Xu, W Qiao, Y Li… - Optics …, 2024 - opg.optica.org
Topography measurement of high aspect ratio trench array using coherence scanning
interferometry presents significant challenges because the numerical aperture of detection …

Non-integral depth measurement of high-aspect-ratio multi-layer microstructures using numerical-aperture shaped beams

WH Chein, FS Yang, K Thakur, GW Wu… - Optics and Lasers in …, 2023 - Elsevier
This work presents a new optical metrology technique for accurate depth measurement of
individual high-aspect-ratio (HAR) multi-layer microstructures with high spatial resolution …

Non-integral model-based scatterometry for CD metrology of single high-aspect-ratio microstructures

WH Chein, FS Yang, ZY Fu… - … Topography: Metrology and …, 2023 - iopscience.iop.org
This article presents an innovative model-based scatterometry method for CD metrology of
single high-aspect-ratio (HAR) microstructures, which are increasingly utilized in advanced …

Research on the modulation aberration numerical correction method of interference signals for high aspect ratio samples utilizing coherence scanning interferometry

W Qiao, Z Gao, D Zhu, L Chen, Z Guo, J Ma, X Huo… - Optics …, 2025 - opg.optica.org
Coherence scanning interferometry (CSI) is a non-destructive method for measuring the
microstructure surface topography, but it fails to retrieve the bottom topography because the …

Electromagnetic analysis for optical coherence tomography based through silicon vias metrology

WA Iff, JP Hugonin, C Sauvan, M Besbes, P Chavel… - Applied …, 2019 - opg.optica.org
This paper reports on progress in the analysis of time-domain optical coherence tomography
(OCT) applied to the dimensional metrology of through-silicon vias (TSVs), which are vertical …

Methods for latent image simulations in photolithography with a polychromatic light attenuation equation for fabricating VIAs in 2.5 D and 3D advanced packaging …

DC Smallwood, P McCloskey, C O'Mathuna… - Microsystems & …, 2021 - nature.com
As demand accelerates for multifunctional devices with a small footprint and minimal power
consumption, 2.5 D and 3D advanced packaging architectures have emerged as an …