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Chemical, Structural, and Electrical Changes in Molecular Layer-Deposited Hafnicone Thin Films after Thermal Processing
Post deposition annealing of molecular layer-deposited (MLD) hafnicone films was
examined and compared to that of hafnium oxide atomic layer-deposited (ALD) films …
examined and compared to that of hafnium oxide atomic layer-deposited (ALD) films …
Develo** Al & Hf Based Hybrid Molecular and Atomic Layer Deposited Films for Low-k Etch Stop Applications
V Vemuri - 2024 - search.proquest.com
Modern devices, including calculators, sensors, and computers, rely heavily on integrated
circuits (ICs). For the advancement of semiconductors in the modern era, progress entails …
circuits (ICs). For the advancement of semiconductors in the modern era, progress entails …