IC metrology is a necessary means for measuring the fabrication performance in the
semiconductor industry. It is significant for yield enhancement and process control. However …

Frequent monitoring in both tool and process is required to detect the quality issue early so
as to improve the process stability of semiconductor manufacturing. However, more tool and …

The objective of this paper is to present the utilization of information produced during plasma
etching for the prediction of etch bias. A plasma etching process typically relies on the …

Daily wafer fabrication in semiconductor foundry depends on considerable metrology
operations for tool-quality and process-quality assurance. The metrology operations …

Metrology methods and systems are provided, which measure metrology targets during the
exposure stage using reflected or diffracted exposure illumination or additional …

The operational cost of 300 mm wafer production is significantly greater than that of 200 mm
fabrications. Real-time monitoring of product can save time and money through reduced …

The objective of this work is the creation of predictive models that can forecast the electrical
or physical parameters of wafers using data collected from the relevant processing tools. In …

A typical 65 nm manufacturing process normally contains 400-500 process steps. Many
factors in production line could cause production quality shift and/or drift. Especially, when a …

In semiconductor/FPD (flat panel display) manufacturing environments, APC (advanced
process control) is a vital task for enhancing yield. The APC technology improves the …

Two SOM ANN approaches were used in a study of Australian railway drivers (RDs) to
classify RDs' sleep/wake states and their sleep duration time series profiles over 14 days …