A review of low‐temperature solution‐processed metal oxide thin‐film transistors for flexible electronics
Solution processing, including printing technology, is a promising technique for oxide thin‐
film transistor (TFTs) fabrication because it tends to be a cost‐effective process with high …
film transistor (TFTs) fabrication because it tends to be a cost‐effective process with high …
Mimicking biological synapses with a-HfSiOx-based memristor: implications for artificial intelligence and memory applications
Memristors, owing to their uncomplicated structure and resemblance to biological synapses,
are predicted to see increased usage in the domain of artificial intelligence. Additionally, to …
are predicted to see increased usage in the domain of artificial intelligence. Additionally, to …
Controllable analog resistive switching and synaptic characteristics in ZrO2/ZTO bilayer memristive device for neuromorphic systems
The development of artificial synaptic devices is a crucial step for the realization of efficient
bio-inspired neuromorphic computing systems. In this work, the bilayer ZrO 2/ZTO-based …
bio-inspired neuromorphic computing systems. In this work, the bilayer ZrO 2/ZTO-based …
Printed flexible and transparent electronics: Enhancing low-temperature processed metal oxides with 0D and 1D nanomaterials
W Scheideler, V Subramanian - Nanotechnology, 2019 - iopscience.iop.org
Metal oxides have broad multifunctionality and important applications to energy, sensing,
and information display. Printed electronics have recently adopted metal oxides to push the …
and information display. Printed electronics have recently adopted metal oxides to push the …
Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer …
W Zhang, JZ Kong, ZY Cao, AD Li, LG Wang… - Nanoscale research …, 2017 - Springer
Abstract The HfO 2/TiO 2/HfO 2 trilayer-structure resistive random access memory (RRAM)
devices have been fabricated on Pt-and TiN-coated Si substrates with Pt top electrodes by …
devices have been fabricated on Pt-and TiN-coated Si substrates with Pt top electrodes by …
Effects of deposition temperature on the device characteristics of oxide thin-film transistors using In–Ga–Zn–O active channels prepared by atomic-layer deposition
We demonstrated the physical and electrical properties of the In–Ga–Zn–O (IGZO) thin films
prepared by atomic-layer deposition (ALD) method and investigated the effects of the ALD …
prepared by atomic-layer deposition (ALD) method and investigated the effects of the ALD …
Tungsten-Doped Indium Tin Oxide Thin-Film Transistors for Dual-mode Proximity Sensing Application
W Zeng, Z Peng, D Lin, AA Guliakova… - … Applied Materials & …, 2023 - ACS Publications
Technologies for human–machine interactions are booming now. In order to achieve
multifunctional sensing abilities of electronic skins, further developments of various sensors …
multifunctional sensing abilities of electronic skins, further developments of various sensors …
Solution-Processable LaZrOx/SiO2 Gate Dielectric at Low Temperature of 180 °C for High-Performance Metal Oxide Field-Effect Transistors
SY Je, BG Son, HG Kim, MY Park, LM Do… - … applied materials & …, 2014 - ACS Publications
Although solution-processable high-k inorganic dielectrics have been implemented as a
gate insulator for high-performance, low-cost transition metal oxide field-effect transistors …
gate insulator for high-performance, low-cost transition metal oxide field-effect transistors …
Low-temperature and high-performance ZnSnO thin film transistor activated by lightwave irradiation
Q Zhang, C Ruan, H Gong, G **a, S Wang - Ceramics International, 2021 - Elsevier
Ultra-high-resolution and flexible display applications require high-performance oxide thin
film transistors (TFTs) fabricated at low temperatures. This study fabricated low-temperature …
film transistors (TFTs) fabricated at low temperatures. This study fabricated low-temperature …
Synaptic functions and a memristive mechanism on Pt/AlOx/HfOx/TiN bilayer-structure memristors
C Liu, LG Wang, YQ Cao, MZ Wu, YD **a… - Journal of Physics D …, 2019 - iopscience.iop.org
Abstract In this paper, Pt/AlO x/HfO x/TiN bilayer-structure memristors were fabricated by
atomic layer deposition. Some essential synaptic biological functions are achieved in such a …
atomic layer deposition. Some essential synaptic biological functions are achieved in such a …