A review of low‐temperature solution‐processed metal oxide thin‐film transistors for flexible electronics

JW Park, BH Kang, HJ Kim - Advanced Functional Materials, 2020 - Wiley Online Library
Solution processing, including printing technology, is a promising technique for oxide thin‐
film transistor (TFTs) fabrication because it tends to be a cost‐effective process with high …

Mimicking biological synapses with a-HfSiOx-based memristor: implications for artificial intelligence and memory applications

M Ismail, M Rasheed, C Mahata, M Kang, S Kim - Nano Convergence, 2023 - Springer
Memristors, owing to their uncomplicated structure and resemblance to biological synapses,
are predicted to see increased usage in the domain of artificial intelligence. Additionally, to …

Controllable analog resistive switching and synaptic characteristics in ZrO2/ZTO bilayer memristive device for neuromorphic systems

M Ismail, H Abbas, C Choi, S Kim - Applied Surface Science, 2020 - Elsevier
The development of artificial synaptic devices is a crucial step for the realization of efficient
bio-inspired neuromorphic computing systems. In this work, the bilayer ZrO 2/ZTO-based …

Printed flexible and transparent electronics: Enhancing low-temperature processed metal oxides with 0D and 1D nanomaterials

W Scheideler, V Subramanian - Nanotechnology, 2019 - iopscience.iop.org
Metal oxides have broad multifunctionality and important applications to energy, sensing,
and information display. Printed electronics have recently adopted metal oxides to push the …

Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer …

W Zhang, JZ Kong, ZY Cao, AD Li, LG Wang… - Nanoscale research …, 2017 - Springer
Abstract The HfO 2/TiO 2/HfO 2 trilayer-structure resistive random access memory (RRAM)
devices have been fabricated on Pt-and TiN-coated Si substrates with Pt top electrodes by …

Effects of deposition temperature on the device characteristics of oxide thin-film transistors using In–Ga–Zn–O active channels prepared by atomic-layer deposition

SM Yoon, NJ Seong, K Choi, GH Seo… - ACS applied materials …, 2017 - ACS Publications
We demonstrated the physical and electrical properties of the In–Ga–Zn–O (IGZO) thin films
prepared by atomic-layer deposition (ALD) method and investigated the effects of the ALD …

Tungsten-Doped Indium Tin Oxide Thin-Film Transistors for Dual-mode Proximity Sensing Application

W Zeng, Z Peng, D Lin, AA Guliakova… - … Applied Materials & …, 2023 - ACS Publications
Technologies for human–machine interactions are booming now. In order to achieve
multifunctional sensing abilities of electronic skins, further developments of various sensors …

Solution-Processable LaZrOx/SiO2 Gate Dielectric at Low Temperature of 180 °C for High-Performance Metal Oxide Field-Effect Transistors

SY Je, BG Son, HG Kim, MY Park, LM Do… - … applied materials & …, 2014 - ACS Publications
Although solution-processable high-k inorganic dielectrics have been implemented as a
gate insulator for high-performance, low-cost transition metal oxide field-effect transistors …

Low-temperature and high-performance ZnSnO thin film transistor activated by lightwave irradiation

Q Zhang, C Ruan, H Gong, G **a, S Wang - Ceramics International, 2021 - Elsevier
Ultra-high-resolution and flexible display applications require high-performance oxide thin
film transistors (TFTs) fabricated at low temperatures. This study fabricated low-temperature …

Synaptic functions and a memristive mechanism on Pt/AlOx/HfOx/TiN bilayer-structure memristors

C Liu, LG Wang, YQ Cao, MZ Wu, YD **a… - Journal of Physics D …, 2019 - iopscience.iop.org
Abstract In this paper, Pt/AlO x/HfO x/TiN bilayer-structure memristors were fabricated by
atomic layer deposition. Some essential synaptic biological functions are achieved in such a …