Si–Ge–Sn alloys: From growth to applications

S Wirths, D Buca, S Mantl - Progress in crystal growth and characterization …, 2016 - Elsevier
In this review article, we address key material parameters as well as the fabrication and
application of crystalline GeSn binary and SiGeSn ternary alloys. Here, the transition from an …

[HTML][HTML] Heteroepitaxial growth of III-V semiconductors on silicon

JS Park, M Tang, S Chen, H Liu - Crystals, 2020 - mdpi.com
Monolithic integration of III-V semiconductor devices on Silicon (Si) has long been of great
interest in photonic integrated circuits (PICs), as well as traditional integrated circuits (ICs) …

High‐Speed Photodetectors on Silicon Photonics Platform for Optical Interconnect

G Chen, Y Yu, Y Shi, N Li, W Luo, L Cao… - Laser & Photonics …, 2022 - Wiley Online Library
A photodetector (PD) converts optical signals into electrical ones and is widely used in
optical interconnect. High‐speed PDs are in high demand as they are necessary to meet …

Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors

ML Lee, EA Fitzgerald, MT Bulsara, MT Currie… - Journal of applied …, 2005 - pubs.aip.org
This article reviews the history and current progress in high-mobility strained Si, SiGe, and
Ge channel metal-oxide-semiconductor field-effect transistors (MOSFETs). We start by …

High-mobility Si and Ge structures

F Schäffler - Semiconductor Science and Technology, 1997 - iopscience.iop.org
Silicon-based heterostructures have come a long way from the discovery of strain as a new
and essential parameter for band structure engineering to the present state of electron and …

Dislocations in strained-layer epitaxy: theory, experiment, and applications

EA Fitzgerald - Materials science reports, 1991 - Elsevier
In this review paper, we first present an historical perspective of theoretical work and some
early experimental work in the field of dislocations in strained-layer epitaxy. Equilibrium …

Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

MT Currie, SB Samavedam, TA Langdo… - Applied physics …, 1998 - pubs.aip.org
A method of controlling threading dislocation densities in Ge on Si involving graded SiGe
layers and chemical-mechanical polishing (CMP) is presented. This method has allowed us …

Graphene-assisted spontaneous relaxation towards dislocation-free heteroepitaxy

SH Bae, K Lu, Y Han, S Kim, K Qiao, C Choi… - Nature …, 2020 - nature.com
Although conventional homoepitaxy forms high-quality epitaxial layers,,,–, the limited set of
material systems for commercially available wafers restricts the range of materials that can …

Ge-photodetectors for Si-based optoelectronic integration

J Wang, S Lee - Sensors, 2011 - mdpi.com
High speed photodetectors are a key building block, which allow a large wavelength range
of detection from 850 nm to telecommunication standards at optical fiber band passes of 1.3 …

Si/ge nanostructures

K Brunner - Reports on Progress in Physics, 2001 - iopscience.iop.org
A review is given on the formation mechanisms and the properties of Si/Ge nanostructures
that have been synthesized by self-assembling and self-ordering during heteroepitaxy …