Defectivity avoidance in chemical mechanical planarization: Role of multi-scale and multi-physics...

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An integrated wafer surface evolution model for chemical mechanical planarization (CMP)

A Chandra, AF Bastawros, X Wang… - Micromanufacturing …, 2012 - api.taylorfrancis.com
Chemical mechanical planarization (CMP) is recognized as a promising planarization
method in integrated circuit (IC) manufacturing. A detailed description of the CMP process …
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An Integrated Wafer Surface Evolution Model for Chemical Mechanical Planarization (CMP).................................................................................... Micayla Haugen

A Chandra, AF Bastawros, X Wang… - Micromanufacturing …, 2016 - taylorfrancis.com
Chemical mechanical planarization (CMP) is recognized as a promising planarization
method in integrated circuit (IC) manufacturing. A detailed description of the CMP process …
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[KÖNYV][B] Mechanics framework of pad scratching in chemical-mechanical planarization

DC Ponte - 2015 - search.proquest.com
Abstract Chemical-Mechanical Planarization (CMP) is a crucial intermediate process in
integrated circuit (IC) fabrication. As the average IC feature size decreases each year …
Mentés Hivatkozás Kapcsolódó cikkek Mind a(z) 4 változat Könyvtári keresés