A faucet for dispensing a fluid includes a spout, a pull-out spray head removably coupled to
the spout and including an outlet, and a valve assembly in fluid communication with the …

The present invention is a method of cleaning to removal residue in semiconductor
manufacturing processing, comprising contacting a surface to be cleaned with an aqueous …

Cleaning compounds, apparatus, and methods to remove contaminants from a substrate
surface are provided. An exemplary cleaning compound to remove particulate contaminants …

CO2F 1/78(2006.01) E03C 1/05(2006.01) CO2F 1/467(2006.01) E03C 1/04(2006.01)(52)
US CI. CPC CO2F 1/78 (2013.01); E03C 1/055 (2013.01); CO2F 1/4672 (2013.01); CO2F …

BACKGROUND In the fabrication of semiconductor devices such as inte grated circuits,
memory cells, and the like, a series of manu facturing operations are performed to define …

The embodiments of the present invention provide improved materials for cleaning
patterned substrates with fine features. The cleaning materials have advantages in cleaning …

BACKGROUND There exists a desire to reduce critical dimensions of fea tures in electronic
Substrate products. As the features decrease in size, the impact of contaminants during …

US8845812B2 - Method for contamination removal using magnetic particles - Google
Patents US8845812B2 - Method for contamination removal using magnetic particles …

(57) ABSTRACT A method and system for cleaning a surface, having particu late matter
thereon, of a Substrate features im**ing upon the Surface a jet of a liquid having coupling …

Material for cleaning using a tri-state body are disclosed. A substrate having a particle
deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a …