Lattice strain and defects analysis in nanostructured semiconductor materials and devices by high‐resolution X‐ray diffraction: Theoretical and practical aspects
The reliability of semiconductor materials with electrical and optical properties are
connected to their structures. The elastic strain field and tilt analysis of the crystal lattice …
connected to their structures. The elastic strain field and tilt analysis of the crystal lattice …
Dislocations as active components in novel silicon devices
M Kittler, M Reiche - Advanced Engineering Materials, 2009 - Wiley Online Library
The electrical and optical properties of dislocations in Si are reviewed, namely dislocation‐
related recombination and luminescence, transport of minority and majority carriers along …
related recombination and luminescence, transport of minority and majority carriers along …
Dislocations in silicon and D-band luminescence for infrared light emitters
VV Kveder, M Kittler - Materials Science Forum, 2008 - Trans Tech Publ
There is a growing demand for a silicon-based light emitters generating a light with a
wavelength in of 1.3-1.6 μm range, which can be integrated into silicon chips and used for in …
wavelength in of 1.3-1.6 μm range, which can be integrated into silicon chips and used for in …
Enhancement of room temperature dislocation-related photoluminescence of electron irradiated silicon
L **ang, D Li, L **, S Wang, D Yang - Journal of Applied Physics, 2013 - pubs.aip.org
In this paper, we have investigated the room temperature dislocation-related
photoluminescence of electron irradiated silicon. It is found that high temperature annealing …
photoluminescence of electron irradiated silicon. It is found that high temperature annealing …
Influence of electric field on spectral positions of dislocation-related luminescence peaks in silicon: Stark effect
T Mchedlidze, T Arguirov, M Kittler, T Hoang… - Applied physics …, 2007 - pubs.aip.org
Spectral positions of dislocation-related luminescence (DRL) peaks from dislocation loops
located close to a pn junction in silicon were shifted by carrier injection level. We suppose …
located close to a pn junction in silicon were shifted by carrier injection level. We suppose …
Structures responsible for radiative and non‐radiative recombination activity of dislocations in silicon
T Mchedlidze, T Arguirov, O Kononchuk… - … status solidi c, 2011 - Wiley Online Library
Regular dislocation networks (DN) formed by direct bonding of Si wafers actively participate
in recombination of minority carriers. Besides nonradiative recombination (NRR), dislocation …
in recombination of minority carriers. Besides nonradiative recombination (NRR), dislocation …
Silicon based IR light emitters
M Kittler, T Mchedlidze, T Arguirov… - … status solidi c, 2009 - Wiley Online Library
A new concept for Si‐based light emitting diodes (LED) capable of emitting at 1.5 μm is
proposed. It utilizes D‐band radiation from dislocations in Si. Whether a dislocation network …
proposed. It utilizes D‐band radiation from dislocations in Si. Whether a dislocation network …
Dislocation-related electroluminescence of silicon after electron irradiation
L **ang, D Li, L **, D Yang - Solid state communications, 2012 - Elsevier
This letter describes a novel method of introducing controllable dislocations in silicon by
electron irradiation. A corresponding dislocation-related light emitting diode with∼ 1.6 μm …
electron irradiation. A corresponding dislocation-related light emitting diode with∼ 1.6 μm …
Electroluminescence from pin structure fabricated using crystalline silicon on glass technology
T Mchedlidze, T Arguirov, M Holla… - Journal of Applied Physics, 2009 - pubs.aip.org
Electroluminescence from pin structure fabricated using crystalline silicon on glass technology
| Journal of Applied Physics | AIP Publishing Skip to Main Content Umbrella Alt Text Umbrella …
| Journal of Applied Physics | AIP Publishing Skip to Main Content Umbrella Alt Text Umbrella …
Methods for producing new silicon light source and devices
S Kalem - US Patent 9,337,395, 2016 - Google Patents
The present invention relates to production method and device applications of a new silicon
(Si) semiconductor light source that emits at a single wavelength at 1320 nm with a full width …
(Si) semiconductor light source that emits at a single wavelength at 1320 nm with a full width …