Industrial applications based on plasma polymerization require reliable processes that can
be transferred to production‐scale reactors. To enable an inexpensive access to control …

Abstract Low‐pressure, plasma‐enhanced (PE) CVD is a powerful and versatile technique
that has been used for thin‐film deposition and surface treatment since the early 1960s …

This review focuses on the use of diagnostic tools to examine plasma processing chemistry,
primarily plasma species energetics, dynamics, and molecule-surface reactions. We …

Gas-phase and surface analysis techniques were utilized to investigate the effects of gas-
phase species on plasma deposited diamond-like carbon (DLC) thin films. A vacuum system …

Inductively-coupled C x F y (y/x= 2.0–4.0) plasma systems were investigated to determine
relationships between precursor chemistry, CF n radical-surface reactivities, and surface …

Plasma polymerization covers a broad range of plasma deposits from soft to hard coatings.
Nanoscale coatings are formed within a dry and eco-friendly process on different substrate …

We have applied both sinusoidal and pulse-shaped rf substrate biasing techniques to the
expanding thermal plasma deposition of hydrogenated amorphous silicon. Spectroscopic …

Hydrogenated amorphous carbon nitride (aC: N: H) films were synthesized from CH 4∕ N
2⁠, C 2 H 4∕ N 2⁠, and C 2 H 2∕ N 2 gas mixtures using inductively coupled rf plasmas …

Fluorocarbon (FC) films deposited in continuous wave (cw) and pulsed difluoromethane
radio frequency (rf) plasmas were characterized using Fourier transform infrared …

The molecular-level chemistry involved in the processing of silicon and zirconia substrates
by inductively coupled fluorocarbon (FC) plasmas produced from CF 4 and C 2 F 6 …