Photoacid generators are used as components of photocurable polymer formulations and
chemically amplified photoresists in microelectronics industry. In recent years, these …

Two-photon lithography (TPL) has been continuously improved and employed in versatile
additive manufacturing for decades. Unfortunately, large-scale 2D nano additive …

The development of a sustainable process for producing high-performance photoresists is
desirable yet challenging. In this study, we proposed an ionic liquid (IL)-assisted approach …

Inorganic resists have emerged as promising candidates in semiconductor industries to
realize sub-10 nm node technology. However, controlling vertical shrinkage of resist films …

Given the need for advanced resist materials in view of fast shrinkage of semiconductor
node scaling, this work demonstrates the lithography application of an organotin-based …

Advanced photoresists must satisfy stringent sensitivity requirements while maintaining the
ability to print ever‐shrinking critical dimensions. However, the unavoidable acid diffusion …

Although many organic polymer based photoresists are useful for patterning high resolution
sub-20 nm technology nodes, many such resists suffer from poor sensitivity. One of the …

Extending the resolution limit of next-generation lithography down to 15 nm or below
requires the resist to attain small features, high irradiation sensitivity, and low line …

Acrylate photoresists have gained considerable attention in recent years owing to their high
resolution, high sensitivity, and versality. In this work, a series of thermally stable copolymers …

Abstract Five novel 9, 10‐dithio/oxo‐anthracenes (ANs) are synthesized, which can be used
as efficient photosensitizers for a biimidazole (BCIM) photoinitiator system in dry film …