Dopant, composition and carrier profiling for 3D structures

W Vandervorst, C Fleischmann, J Bogdanowicz… - Materials Science in …, 2017 - Elsevier
With the transition from planar to three-dimensional device architectures, devices such as
FinFETs, TFETs and nanowires etc. become omnipresent. This requires the dopant atom …

Nanoindentation induced deformation and pop-in events in a silicon crystal: molecular dynamics simulation and experiment

S Jiapeng, L Cheng, J Han, A Ma, L Fang - Scientific reports, 2017 - nature.com
Silicon has such versatile characteristics that the mechanical behavior and deformation
mechanism under contact load are still unclear and hence are interesting and challenging …

[KSIĄŻKA][B] Metrology and Diagnostic Techniques for Nanoelectronics

Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

Nonuniform Ionic and Electronic Transport of Ceramic and Polymer/Ceramic Hybrid Electrolyte by Nanometer‐Scale Operando Imaging for Solid‐State Battery

CS Jiang, N Dunlap, Y Li, H Guthrey… - Advanced Energy …, 2020 - Wiley Online Library
Replacing the liquid electrolyte in lithium batteries with solid‐state ion conductor is
promising for next‐generation energy storage that is safe and has high energy density …

Thin-film TaAs: Develo** a platform for Weyl semimetal devices

JN Nelson, AD Rice, R Kurleto, A Shackelford… - Matter, 2023 - cell.com
MX monopnictide compounds (M= Nb, Ta, X= As, P) are prototypical 3D Weyl semimetals
(WSMs) that have been shown in bulk single crystal form to have potential for a wide variety …

Application of atomic force microscopy technology in do** characterization of semiconductor materials and devices

X Liu, X Wang, X Liu, Y Song, Y Zhang, H Wang… - Microelectronic …, 2024 - Elsevier
The precise characterization of the do** profile is crucial for optimizing the performance
and structural integrity of semiconductor devices. As the size of semiconductor devices …

In situ observation of the indentation-induced phase transformation of silicon thin films

YB Gerbig, CA Michaels, AM Forster, RF Cook - Physical Review B …, 2012 - APS
Indentation-induced phase transformation processes were studied by in situ Raman
microspectroscopy of the deformed contact region of silicon on sapphire samples during …

Shear-induced chemical segregation in a Fe-based bulk metallic glass at room temperature

DV Louzguine-Luzgin, AS Trifonov, YP Ivanov… - Scientific Reports, 2021 - nature.com
Shear-induced segregation, by particle size, is known in the flow of colloids and granular
media, but is unexpected at the atomic level in the deformation of solid materials, especially …

Microelectronic Structure and Do** Nonuniformity of Phosphorus-Doped CdSeTe Solar Cells

CS Jiang, R Farshchi, T Nagle, D Lu… - … Applied Materials & …, 2025 - ACS Publications
Optimizing group-V do** and Se alloying are two main focuses for advancing CdTe
photovoltaic technology. We report on nanometer-scale characterizations of microelectronic …

Influence of normal load on the three-body abrasion behaviour of monocrystalline silicon with ellipsoidal particle

J Shi, J Chen, X Wei, L Fang, K Sun, J Sun, J Han - RSC advances, 2017 - pubs.rsc.org
Currently, monocrystalline silicon has been widely applied in micro-electro-mechanical
systems (MEMSs). It is of importance to reveal the wear behavior of the MEMS and evaluate …