Ion implantation into gallium nitride

C Ronning, EP Carlson, RF Davis - Physics Reports, 2001 - Elsevier
This comprehensive review is concerned with studies regarding ion implanted gallium
nitride (GaN) and focuses on the improvements made in recent years. It is divided into three …

Thedo** process and dopant characteristics of GaN

JK Sheu, GC Chi - Journal of Physics: Condensed Matter, 2002 - iopscience.iop.org
The characteristic effects of do** with impurities such as Si, Ge, Se, O, Mg, Be, and Zn on
the electrical and optical properties of GaN-based materials are reviewed. In addition, the …

[KNIHA][B] Introduction to nitride semiconductor blue lasers and light emitting diodes

S Nakamura, SF Chichibu - 2000 - taylorfrancis.com
The" blue laser" is an exciting new device used in physics. The potential is now being
recognized for its development into a commercial lighting system using about a tenth of the …

Exciton localization and the Stokes' shift in InGaN epilayers

RW Martin, PG Middleton, KP O'donnell… - Applied physics …, 1999 - pubs.aip.org
We report a comparative study of the emission and absorption spectra of a range of
commercial InGaN light-emitting diodes and high-quality epilayers. A working definition of …

Ultraviolet and violet GaN light emitting diodes on silicon

S Guha, NA Bojarczuk - Applied Physics Letters, 1998 - pubs.aip.org
We report the fabrication and characterization of GaN-based double heterostructure light
emitting diodes grown by molecular beam epitaxy on Si (111) substrates. Light emitting …

Free-carrier and phonon properties of n- and p-type hexagonal GaN films measured by infrared ellipsometry

A Kasic, M Schubert, S Einfeldt, D Hommel, TE Tiwald - Physical Review B, 2000 - APS
Infrared spectroscopic ellipsometry (IRSE) over the wave-number range from 300 to 1200
cm− 1 is used to determine the anisotropic room-temperature optical properties of highly …

Growth of III-nitrides on Si (1 1 1) by molecular beam epitaxy Do**, optical, and electrical properties

E Calleja, MA Sánchez-Garcıa, FJ Sanchez… - Journal of crystal …, 1999 - Elsevier
The growth of high-quality III-nitrides by plasma-assisted molecular beam epitaxy on Si
(111) substrates is addressed. A combination of optimized AlN buffer layers and a two-step …

Highly Sensitive Ultraviolet Photodetector Based on an AlGaN/GaN HEMT with Graphene‐On‐p‐GaN Mesa Structure

B Pandit, HS Jang, Y Jeong, S An… - Advanced Materials …, 2023 - Wiley Online Library
The advantageous role of 2D electron gas presence at the AlGaN/GaN interface attracts
huge interest in the field of GaN‐based ultraviolet photodetector technology. However, the …

Microstructure and electronic properties of InGaN alloys

FA Ponce, S Srinivasan, A Bell, L Geng… - … status solidi (b), 2003 - Wiley Online Library
The InxGa1− xN system has electronic band gaps extending from under 1eV to 3.4 eV, and
as such they are used as the active layer in commercially available visible‐light emitting …

Gallium concentration dependence of room-temperature near-band-edge luminescence in n-type ZnO: Ga

T Makino, Y Segawa, S Yoshida, A Tsukazaki… - Applied Physics …, 2004 - pubs.aip.org
We investigated the optical properties of epitaxial n-type ZnO films grown on lattice-matched
ScAlMgO 4 substrates. As the Ga do** concentration increased up to 6× 10 20 cm− 3⁠ …