Revival of ferroelectric memories based on emerging fluorite‐structured ferroelectrics

JY Park, DH Choe, DH Lee, GT Yu, K Yang… - Advanced …, 2023 - Wiley Online Library
Over the last few decades, the research on ferroelectric memories has been limited due to
their dimensional scalability and incompatibility with complementary metal‐oxide …

HfO2-based ferroelectrics: From enhancing performance, material design, to applications

H Chen, X Zhou, L Tang, Y Chen, H Luo… - Applied Physics …, 2022 - pubs.aip.org
Nonvolatile memories are in strong demand due to the desire for miniaturization, high-speed
storage, and low energy consumption to fulfill the rapid developments of big data, the …

[HTML][HTML] Next generation ferroelectric materials for semiconductor process integration and their applications

T Mikolajick, S Slesazeck, H Mulaosmanovic… - Journal of Applied …, 2021 - pubs.aip.org
Ferroelectrics are a class of materials that possess a variety of interactions between
electrical, mechanical, and thermal properties that have enabled a wealth of functionalities …

[HTML][HTML] Roadmap on ferroelectric hafnia-and zirconia-based materials and devices

JPB Silva, R Alcala, UE Avci, N Barrett, L Bégon-Lours… - APL Materials, 2023 - pubs.aip.org
Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development
over the last decade, pushing them to the forefront of ultralow-power electronic systems …

Low Operating Voltage, Improved Breakdown Tolerance, and High Endurance in Hf0.5Zr0.5O2 Ferroelectric Capacitors Achieved by Thickness Scaling Down to 4 …

K Toprasertpong, K Tahara, Y Hikosaka… - … Applied Materials & …, 2022 - ACS Publications
The comparatively high coercive field in Hf0. 5Zr0. 5O2 (HZO) and other HfO2-based
ferroelectric thin films leads to two critical challenges for their application in embedded …

Factors governing oxygen vacancy formation in oxide perovskites

RB Wexler, GS Gautam, EB Stechel… - Journal of the American …, 2021 - ACS Publications
The control of oxygen vacancy (VO) formation is critical to advancing multiple metal-oxide-
perovskite-based technologies. We report the construction of a compact linear model for the …

Many routes to ferroelectric HfO2: A review of current deposition methods

HA Hsain, Y Lee, M Materano, T Mittmann… - Journal of Vacuum …, 2022 - pubs.aip.org
Although 10 years have passed since the initial report of ferroelectricity in hafnia (HfO 2),
researchers are still intensely fascinated by this material system and the promise it holds for …

A review on morphotropic phase boundary in fluorite-structure hafnia towards DRAM technology

M Jung, V Gaddam, S Jeon - Nano Convergence, 2022 - Springer
In the present hyper-scaling era, memory technology is advancing owing to the demand for
high-performance computing and storage devices. As a result, continuous work on …

Interplay between oxygen defects and dopants: effect on structure and performance of HfO 2-based ferroelectrics

M Materano, PD Lomenzo, A Kersch… - Inorganic Chemistry …, 2021 - pubs.rsc.org
Ten years after the first report on ferroelectricity in HfO2, researchers are still occupied
unraveling the different causes behind this phenomenon. Among them, oxygen related …

Epitaxial Ferroelectric HfO2 Films: Growth, Properties, and Devices

I Fina, F Sanchez - ACS Applied Electronic Materials, 2021 - ACS Publications
About ten years after ferroelectricity was first reported in doped HfO2 polycrystalline films,
there is tremendous interest in this material and ferroelectric oxides are once again in the …