Selective area formation of arsenic oxide-rich octahedral microcrystals during photochemical etching of n-type GaAs
A Udupa, X Yu, L Edwards, LL Goddard - Optical Materials Express, 2018 - opg.optica.org
We demonstrate how to spatially localize the formation of octahedral arsenic oxide
microcrystals in selective areas of highly doped n-type GaAs substrates during rapid digital …
microcrystals in selective areas of highly doped n-type GaAs substrates during rapid digital …
Digital projection photochemical etching for gray-scale semiconductor applications
K Wang - 2015 - ideals.illinois.edu
In the contemporary semiconductor industry, with the ever-growing demand for smaller,
denser, and newer device features, various industrial and academic research groups across …
denser, and newer device features, various industrial and academic research groups across …