Solvent-assisted block copolymer self-assembly is a compelling method for processing and
advancing practical applications of these materials due to the exceptional level of the control …

Block copolymers have garnered significant attention in the past few decades due to their
ability to self-assemble into nanoscale structures (∼ 10–100 nm), making them ideal for …

We report a method for tuning the domain spacing (D sp) of self-assembled block copolymer
thin films of poly (styrene-block-methyl methacrylate)(PS-b-PMMA) over a large range of …

Large-scale molecular dynamics simulations are used to study the dispersion of
nanoparticles (NPs) in a polymer film during solvent evaporation. As the solvent evaporates …

Block copolymer (BCP) thin films have attracted significant attention as lithographic
templates, separation membranes, and organic photovoltaic active layers for emerging …

Multiblock copolymers synthesized via reversible addition–fragmentation transfer (RAFT)
emulsion polymerization offer a pathway to creating new nanoengineered materials …

Microphase separation of block copolymer (BCPs) thin films has high potential as a surface
patterning technique. However, the process times (during thermal or solvent anneal) can be …

Blends of block copolymers can form phases and exhibit features distinct from the
constituent materials. We study thin film blends of cylinder-forming and lamellar-forming …

The pattern coarsening dynamics in symmetric polystyrene-b-polymethylmethacrylate (PS-b-
PMMA) block copolymer thin films under conventional thermal treatments is extremely slow …

With their ability to self-assemble spontaneously into well-defined nanoscale morphologies,
block copolymer (BCP) thin films are a versatile platform to fabricate functional …