Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐
throughput patterning of polymer nanostructures at great precision and at low costs. Unlike …

Extreme ultraviolet interference lithography (EUV-IL) is a newly developed technique for the
production of periodic nano-structures with resolution below 20 nm. The technique is based …

Metasurfaces operating in the cross-polarization scheme have shown an interesting degree
of control over the wavefront of transmitted light. Nevertheless, their inherently low efficiency …

The ability of micro-to nanometer-scale patterning on ffexible substrates can enable many
new applications in the area of photonics and organic electronics. A major roadblock has …

The response of optical metasurfaces is usually narrowband, and mechanisms to increase
their bandwidth often clash with causality and passivity constraints of materials. Here we are …

We report experimental and theoretical analysis of the plasmonic resonances of Al
nanoparticles and nanorods. Ordered nanoparticle arrays with well-defined shapes and …

Large-area, 100 mm in diameter, aluminum nanowire grids with 40 nm line/78 nm space
were fabricated with full-wafer immersion interference lithography. The aluminum nanowire …

Random metasurfaces have demonstrated significant potential in radar‐signature control
applications, but their ability to manipulate scattering‐field reduction is limited by relying …

Inverse‐vulcanized polymeric sulfur has received considerable attention for application in
waste‐based infrared (IR) polarizers with high polarization sensitivities, owing to its high …

Chiral metamaterials represent a special type of artificial structures that cannot be
superposed to their mirror images. Due to the lack of mirror symmetry, cross-coupling …