Over the last ten years, expansion of atmospheric pressure plasma solutions for surface
treatment of materials has been remarkable, however direct plasma technology for thin film …

High‐temperature capability is critical for polymer dielectrics in the next‐generation
capacitors demanded in harsh‐environment electronics and electrical‐power applications. It …

In this study, a large-scale roll-to-roll initiated chemical vapor deposition (iCVD) system was
developed to allow for coating superhydrophobic thin films on flexible substrates. Poly …

Hybrid organically bridged silica membranes are suitable for energy-efficient molecular
separations under harsh industrial conditions. Such membranes can be useful in organic …

Effective transparent barrier/encapsulation systems represent a key enabling technology for
large‐area electronics. Securing stability to the environment is vital. Here, the effects of …

Nonthermal plasmas generated under atmospheric pressure (AP) have been receiving
increased attention in direct plasma technology applications for thin film deposition. This is …

An atmospheric pressure dielectric barrier discharge (DBD) was applied for the deposition of
silica‐like moisture barrier films on polyethylene 2, 6 naphthalate foil. The diffuse plasma …

Highlights•Produced a homogeneous, non-thermal, and stable plasma for deposition of
thermal resistance organic coatings.•Designed an innovative, one-step, safe, low-cost, and …

The barrier properties of the technologically attractive amorphous silica films depend on
their structural characteristics at the atomic level, which, in turn are strongly influenced by the …

This study is a review of plasma enhanced chemical vapor deposition (PECVD) at
atmospheric pressure. Sources for coatings over large area are presented. Millimetric …