Defect identification in semiconductors with positron annihilation:<? format?> Experiment and theory
Positron annihilation spectroscopy is particularly suitable for studying vacancy-type
defects<? format?> in semiconductors. Combining state-of-the-art experimental and …
defects<? format?> in semiconductors. Combining state-of-the-art experimental and …
A review of thermal processing in the subsecond range: semiconductors and beyond
L Rebohle, S Prucnal, W Skorupa - Semiconductor Science and …, 2016 - iopscience.iop.org
Thermal processing in the subsecond range comprises modern, non-equilibrium annealing
techniques which allow various material modifications at the surface without affecting the …
techniques which allow various material modifications at the surface without affecting the …
Room-temperature sub-band gap optoelectronic response of hyperdoped silicon
JP Mailoa, AJ Akey, CB Simmons, D Hutchinson… - Nature …, 2014 - nature.com
Room-temperature infrared sub-band gap photoresponse in silicon is of interest for
telecommunications, imaging and solid-state energy conversion. Attempts to induce infrared …
telecommunications, imaging and solid-state energy conversion. Attempts to induce infrared …
Room-temperature short-wavelength infrared Si photodetector
Y Berencén, S Prucnal, F Liu, I Skorupa, R Hübner… - Scientific reports, 2017 - nature.com
The optoelectronic applications of Si are restricted to the visible and near-infrared spectral
range due to its 1.12 eV-indirect band gap. Sub-band gap light detection in Si, for instance …
range due to its 1.12 eV-indirect band gap. Sub-band gap light detection in Si, for instance …
Hyperdoped silicon materials: from basic materials properties to sub-bandgap infrared photodetectors
MJ Sher, EG Hemme - Semiconductor Science and Technology, 2023 - iopscience.iop.org
Hyperdo** silicon, which introduces deep-level dopants into Si at concentrations near one
atomic percent, drastically changes its optoelectronic properties. We review recent progress …
atomic percent, drastically changes its optoelectronic properties. We review recent progress …
Breaking the do** limit in silicon by deep impurities
n-type do** in Si by shallow impurities, such as P, As, and Sb, exhibits an intrinsic limit
due to the Fermi-level pinning via defect complexes at high do** concentrations. Here, we …
due to the Fermi-level pinning via defect complexes at high do** concentrations. Here, we …
Extended Infrared Photoresponse in -Hyperdoped at Room Temperature
Presently, silicon photonics requires photodetectors that are sensitive in a broad infrared
range, can operate at room temperature, and are suitable for integration with the existing Si …
range, can operate at room temperature, and are suitable for integration with the existing Si …
Infinitesimal sulfur fusion yields quasi-metallic bulk silicon for stable and fast energy storage
A fast-charging battery that supplies maximum energy is a key element for vehicle
electrification. High-capacity silicon anodes offer a viable alternative to carbonaceous …
electrification. High-capacity silicon anodes offer a viable alternative to carbonaceous …
Silicon‐based intermediate‐band infrared photodetector realized by Te hyperdo**
Si‐based photodetectors satisfy the criteria of being low‐cost and environmentally friendly,
and can enable the development of on‐chip complementary metal‐oxide‐semiconductor …
and can enable the development of on‐chip complementary metal‐oxide‐semiconductor …
Emergence of very broad infrared absorption band by hyperdo** of silicon with chalcogens
I Umezu, JM Warrender… - Journal of Applied …, 2013 - pubs.aip.org
We report the near through mid-infrared (MIR) optical absorption spectra, over the range
0.05–1.3 eV, of monocrystalline silicon layers hyperdoped with chalcogen atoms …
0.05–1.3 eV, of monocrystalline silicon layers hyperdoped with chalcogen atoms …