[HTML][HTML] Application of through glass via (TGV) technology for sensors manufacturing and packaging

C Yu, S Wu, Y Zhong, R Xu, T Yu, J Zhao, D Yu - Sensors, 2023 - mdpi.com
Glass has emerged as a highly versatile substrate for various sensor and MEMS packaging
applications, including electromechanical, thermal, optical, biomedical, and RF devices, due …

A review on microholes formation in glass-based substrates by electrochemical discharge drilling for MEMS applications

T Singh, J Arab, P Dixit - Machining Science and Technology, 2022 - Taylor & Francis
Continuous demands to develop advanced radio-frequency transmission at higher
frequencies have initiated glass-based materials as a substrate in radio-frequency micro …

Experimental investigations of energy channelization behavior in ultrasonic assisted electrochemical discharge machining

T Singh, A Dvivedi, A Shanu, P Dixit - Journal of Materials Processing …, 2021 - Elsevier
The present work analyzes the energy channelization behavior during the triplex hybrid
process of ultrasonic assisted electrochemical discharge machining (UA-ECDM). In this …

High inductance density glass embedded inductors for 3-D integration

G Zhou, L Gao, Y Chen, H Chen, W Li… - IEEE Microwave and …, 2023 - ieeexplore.ieee.org
Compared with silicon-based inductors, the inductors with through glass via (TGV)
technology have significantly improved in quality () factor. On the basis of TGV technology, a …

Parametric investigation on an adaptive tool feeding system for ECDM

RK Arya, B Appalanaidu, A Dvivedi - International Journal on Interactive …, 2024 - Springer
Drilling micro holes on various engineering materials have been performed using
electrochemical discharge machining (ECDM), especially non-conductive material. A …

[PDF][PDF] Recent Progress of TGV Technology for High Performance Semiconductor Packaging

BC Seok, JP Jung - Journal of Welding and Joining, 2024 - e-jwj.org
In recent semiconductor packaging, the adoption of through silicon via (TSV) technology has
become crucial for the integration of 2.5 and 3D Si chips, and interposers. The TSV offers …

Electrochemical Discharge Machining

DK Mishra, J Arab, P Dixit - Advanced Machining Science, 2022 - taylorfrancis.com
With the advancement in the miniaturization of electronic components, the requirement for
the micromachining of electrically non-conductive substrates has become more important …

[PDF][PDF] 玻璃通孔三维互连技术中的应力问题

赵瑾, **威, 钟毅, 于大全, 秦飞 - 机械工程学报, 2022 - scholar.archive.org
玻璃通孔(Through glass via, TGV) 三维互连技术由于具有优异的电学, 光学特性,
良好的力学稳定性和低成本等优势, 在三维封装, 集成无源器件和光电器件集成方面具有广泛 …

고성능 반도체패키징을 위한 TGV 기술의 최근 동향

석범창, 정재필 - 대한용접접합학회지, 2024 - kci.go.kr
In recent semiconductor packaging, the adoption of through silicon via (TSV) technology has
become crucial for the integration of 2.5 and 3D Si chips, and interposers. The TSV offers …

[PERNYATAAN][C] Stress issues in 3D interconnect technology using through Glass Vias

赵瑾, **威, 钟毅, 于大全, 秦飞 - Journal of Mechanical Engineering, 2022