Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …

To date, rare earth oxides (REOs) have proven to be key components in generating
sustainable energy solutions, ensuring environmental safety and economic progress due to …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Atomic layer deposition (ALD) is a thin film synthesis technique that can provide exquisite
accuracy and precision in film thickness and composition even on complex, large area …

Because of their unique structural, chemical, optical, and biological properties, metal
phosphate coatings are highly versatile for various applications. Thermodynamically facile …

A new plasma-enhanced atomic layer deposition process was developed to deposit iron
phosphate by using a sequence of trimethyl phosphate (TMP, Me3PO4) plasma, O2 plasma …

Aluminum phosphate thin films were deposited by plasma-assisted atomic layer deposition
(ALD) using a sequence of trimethyl phosphate (TMP, Me3PO4) plasma, O2 plasma, and …

Titanium phosphate thin films were deposited by a new plasma-enhanced atomic layer
deposition process. The process consisted of sequential exposures to trimethyl phosphate …

High‐quality rare earth element (R) based thin films are in demand for applications ranging
from (opto) electronics and energy conversion/storage to medical diagnostics, imaging and …

Zinc phosphate thin films were grown by plasma-enhanced atomic layer deposition (ALD)
using a sequence of trimethyl phosphate (TMP, Me 3 PO 4) plasma, O 2 plasma, and …