Lithobench: Benchmarking ai computational lithography for semiconductor manufacturing
Computational lithography provides algorithmic and mathematical support for resolution
enhancement in optical lithography, which is the critical step in semiconductor …
enhancement in optical lithography, which is the critical step in semiconductor …
DevelSet: Deep neural level set for instant mask optimization
As one of the key techniques for resolution enhancement technologies (RETs), optical
proximity correction (OPC) suffers from prohibitive computational costs as feature sizes …
proximity correction (OPC) suffers from prohibitive computational costs as feature sizes …
L2o-ilt: Learning to optimize inverse lithography techniques
Inverse lithography technique (ILT) is one of the most widely used resolution enhancement
techniques (RETs) to compensate for the diffraction effect in the lithography process …
techniques (RETs) to compensate for the diffraction effect in the lithography process …
Hotspot detection via attention-based deep layout metric learning
With the aggressive and amazing scaling of the feature size of semiconductors, hotspot
detection has become a crucial and challenging problem in the generation of optimized …
detection has become a crucial and challenging problem in the generation of optimized …
AdaOPC: A self-adaptive mask optimization framework for real design patterns
Optical proximity correction (OPC) is a widely-used resolution enhancement technique
(RET) for printability optimization. Recently, rigorous numerical optimization and fast …
(RET) for printability optimization. Recently, rigorous numerical optimization and fast …
Efficient ilt via multi-level lithography simulation
Inverse Lithography Technology (ILT) is a widely investigated method to improve the yield of
chip manufacturing. However, high computational complexity and difficulty in fabricating …
chip manufacturing. However, high computational complexity and difficulty in fabricating …
Ultra-fast source mask optimization via conditional discrete diffusion
Source mask optimization (SMO) is vital for mitigating lithography imaging distortions
caused by shrinking critical dimensions in integrated circuit fabrication. However, the …
caused by shrinking critical dimensions in integrated circuit fabrication. However, the …
Large scale mask optimization via convolutional fourier neural operator and litho-guided self training
Machine learning techniques have been extensively studied for mask optimization
problems, aiming at better mask printability, shorter turnaround time, better mask …
problems, aiming at better mask printability, shorter turnaround time, better mask …
Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography
JT Chen, YY Zhao, X Guo, XM Duan - Optics & Laser Technology, 2025 - Elsevier
Digital micromirror device (DMD)-based maskless projection lithography has gained
significant attention for its maskless, flexible, and cost-effective characteristics. However …
significant attention for its maskless, flexible, and cost-effective characteristics. However …
Enabling scalable AI computational lithography with physics-inspired models
Computational lithography is a critical research area for the continued scaling of
semiconductor manufacturing process technology by enhancing silicon printability via …
semiconductor manufacturing process technology by enhancing silicon printability via …