[HTML][HTML] Efficient extreme ultraviolet emission by multiple laser pulses

T Sugiura, H Yazawa, H Morita, K Sakaue… - Applied Physics …, 2024 - pubs.aip.org
We demonstrated an efficient extreme ultraviolet (EUV) source at a wavelength of 13.5 nm
using spatially separated multiple solid-state-laser pulse irradiation. The maximum …

Plasma sources for advanced semiconductor applications

O Versolato, I Kaganovich, K Bera, T Lill… - Applied Physics …, 2024 - pubs.aip.org
Semiconductors are the foundation of modern technology, used in our personal, industrial,
and military-grade devices. Every aspect of US society is closely tied to semiconductors, and …

Enhancement of spectral performance in gadolinium-based BEUV sources by supplying pre-formed plasma with cavity-confined targets

Z Wen, Z **e, Q Zhang, S Wang, Z Pu, X Song… - Optics …, 2025 - opg.optica.org
Gadolinium laser-produced plasma (Gd-LPP) represents a promising BEUV lithography light
source for future semiconductor manufacturing. In this work, we seek to further enhance the …

Spatial separation of EUV emission and energetic ions by use of double-laser-pulse irradiation

T Sugiura, H Yazawa, T Niinuma… - … Japan 2024: XXX …, 2024 - spiedigitallibrary.org
We have demonstrated the spatial separation of extreme ultraviolet (EUV) emission and
energetic tin (Sn) ions as debris from a laser-produced plasma (LPP) with a double-laser …