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[HTML][HTML] Efficient extreme ultraviolet emission by multiple laser pulses
T Sugiura, H Yazawa, H Morita, K Sakaue… - Applied Physics …, 2024 - pubs.aip.org
We demonstrated an efficient extreme ultraviolet (EUV) source at a wavelength of 13.5 nm
using spatially separated multiple solid-state-laser pulse irradiation. The maximum …
using spatially separated multiple solid-state-laser pulse irradiation. The maximum …
Plasma sources for advanced semiconductor applications
Semiconductors are the foundation of modern technology, used in our personal, industrial,
and military-grade devices. Every aspect of US society is closely tied to semiconductors, and …
and military-grade devices. Every aspect of US society is closely tied to semiconductors, and …
Enhancement of spectral performance in gadolinium-based BEUV sources by supplying pre-formed plasma with cavity-confined targets
Z Wen, Z **e, Q Zhang, S Wang, Z Pu, X Song… - Optics …, 2025 - opg.optica.org
Gadolinium laser-produced plasma (Gd-LPP) represents a promising BEUV lithography light
source for future semiconductor manufacturing. In this work, we seek to further enhance the …
source for future semiconductor manufacturing. In this work, we seek to further enhance the …
Spatial separation of EUV emission and energetic ions by use of double-laser-pulse irradiation
T Sugiura, H Yazawa, T Niinuma… - … Japan 2024: XXX …, 2024 - spiedigitallibrary.org
We have demonstrated the spatial separation of extreme ultraviolet (EUV) emission and
energetic tin (Sn) ions as debris from a laser-produced plasma (LPP) with a double-laser …
energetic tin (Sn) ions as debris from a laser-produced plasma (LPP) with a double-laser …