Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

The ordering of block copolymers in thin films is reviewed, starting from the fundamental
principles and extending to recent promising developments as templates for …

Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …

We demonstrate the fabrication of nanoperforated graphene materials with sub-20-nm
features using cylinder-forming diblock copolymer templates across> 1 mm2 areas …

The ability of random copolymer brushes and cross-linked mats to induce the vertical
orientation of domains in overlying films of lamellae-and cylinder-forming block copolymers …

Chemically patterned surfaces comprised of polymer mats and brushes of well-defined
chemistry were fabricated at the length scale of 10 nm. A key concept is the integration of …

We report novel strategies to integrate block copolymer self-assembly with 193 nm water
immersion lithography. These strategies employ commercially available positive tone …

We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by
performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials …

We report the induction of perpendicularly oriented cylindrical domains in PS-b-PMMA block
copolymer (BCP) films thicker than 100 nm by thermally annealing on a substrate modified …