In-memory computing with emerging nonvolatile memory devices

C Cheng, PJ Tiw, Y Cai, X Yan, Y Yang… - Science China Information …, 2021 - Springer
The von Neumann bottleneck and memory wall have posed fundamental limitations in
latency and energy consumption of modern computers based on von Neumann architecture …

Recent advances in metal nanoparticle‐based floating gate memory

H Chen, Y Zhou, ST Han - Nano Select, 2021 - Wiley Online Library
Nonvolatile memory is distinguished for the application in many electronic products due to
its excellent charge storage ability. Nevertheless, as the device dimensions are scaled …

Nanopore fabrication by controlled dielectric breakdown

H Kwok, K Briggs, V Tabard-Cossa - PloS one, 2014 - journals.plos.org
Nanofabrication techniques for achieving dimensional control at the nanometer scale are
generally equipment-intensive and time-consuming. The use of energetic beams of …

Conduction mechanism of TiN/HfOx/Pt resistive switching memory: A trap-assisted-tunneling model

S Yu, X Guan, HSP Wong - Applied Physics Letters, 2011 - pubs.aip.org
The conduction mechanism of metal oxide resistive switching memory is debated in the
literature. We measured the IV characteristics below the switching voltages through TiN/HfO …

Conduction at domain walls in insulating Pb(ZrTi)O thin films

J Guyonnet, I Gaponenko, S Gariglio… - arxiv preprint arxiv …, 2012 - arxiv.org
Among the recent discoveries of domain wall functionalities, the observation of electrical
conduction at ferroelectric domain walls in the multiferroic insulator BiFeO3 has opened …

Investigation and review of the thermal, mechanical, electrical, optical, and structural properties of atomic layer deposited high-k dielectrics: Beryllium oxide, aluminum …

JT Gaskins, PE Hopkins, DR Merrill… - ECS Journal of Solid …, 2017 - iopscience.iop.org
Atomic layer deposited (ALD) high-dielectric-constant (high-k) materials have found
extensive applications in a variety of electronic, optical, optoelectronic, and photovoltaic …

Interface-engineered organic near-infrared photodetector for imaging applications

AB Siddik, E Georgitzikis, Y Hermans… - … Applied Materials & …, 2023 - ACS Publications
We report a high-speed low dark current near-infrared (NIR) organic photodetector (OPD) on
a silicon substrate with amorphous indium gallium zinc oxide (a-IGZO) as the electron …

Self-assembled oxide films with tailored nanoscale ionic and electronic channels for controlled resistive switching

S Cho, C Yun, S Tappertzhofen, A Kursumovic… - Nature …, 2016 - nature.com
Resistive switches are non-volatile memory cells based on nano-ionic redox processes that
offer energy efficient device architectures and open pathways to neuromorphics and …

Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0. 5Zr0. 5O2 thin films

DH Lee, GT Yu, JY Park, SH Kim, K Yang, GH Park… - Acta Materialia, 2022 - Elsevier
The ferroelectricity in fluorite-structured ferroelectrics such as HfO 2 and ZrO 2 has attracted
increasing interest in both academia and industry. Although the polarization switching …

Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO2/TiN devices

Y Matveyev, K Egorov, A Markeev… - Journal of Applied …, 2015 - pubs.aip.org
Recently proposed novel neural network hardware designs imply the use of memristors as
electronic synapses in 3D cross-bar architecture. Atomic layer deposition (ALD) is the most …